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We report the development of a scanning confocal microscope dedicated to photoluminescence in the 200 nm-wavelength range for samples at cryogenic temperatures (5 K–300 K). We demonstrate the performances of our deep ultraviolet cryomicroscope in high-quality hexagonal boron nitride (hBN) crystals, although it can be utilized for biological studies in its range of operating wavelengths. From the mapping of photoluminescence, we bring evidence for the suppression of extrinsic recombination channels in regions free from defects. The observation of emission spectra dominated by intrinsic recombination processes was never reported before in hBN by means of photoluminescence spectroscopy. We show that photoluminescence tomography now competes with cathodoluminescence and that deep ultraviolet cryomicroscopy by photoluminescence is a novel powerful tool in materials science applications, with the great advantage of an efficient non-invasive photo-excitation of carriers. [ABSTRACT FROM AUTHOR]

The luminescence efficiency of AlxGa1−xN quantum dots (QDs) and quantum wells (QWs), buried in AlN cladding layers and emitting in the ultraviolet range between 234 and 310 nm, has been investigated. The growth and optical properties have been done using similar aluminum composition (varying from 0.4 to 0.75) for both QDs and QWs. In order to compare as much as possible the optical properties, the QWs were fabricated with a growth time tuned such that the QW width is similar to the average height of the QDs. The photoluminescence (PL) showed emission ranging from 4 to 5.4 eV, putting into evidence differences in terms of full width at half maximum, PL intensity, and asymmetry of the line shape between QDs and QWs. The results show shorter wavelengths and a slightly narrower PL linewidth for QWs. To determine the light emission dependence with the electric field direction in the crystal, the evolutions of the emission diagrams for all samples were recorded along two orthogonal directions, namely, the "in-plane" (growth) and the "on-side" directions, from which the light emission was collected. For the whole QDs and QWs samples' series, the shapes of the emission diagram indicate emission in both in-plane and on-side directions, as evidenced by intra-valence band mixings caused by strain effects combined with the anisotropic Coulomb interactions that are particularly contributing to the polarization at wavelengths below 260 nm. Furthermore, the degree of polarization, determined for each sample, showed good agreement with results from the literature. [ABSTRACT FROM AUTHOR]

Boron nitride (BN) layers with sp2 bonding have been grown by metal organic chemical vapor deposition on AlN underlayers, which are deposited on c-plane sapphire substrates. Two different boron precursors were employed—trimethylboron and triethylboron—while ammonia was used as the nitrogen precursor. The BN obtained epitaxial BN films contain ordered rhombohedral (rBN) and partially ordered turbostratic (tBN) stackings as evidenced by x-ray diffraction analysis. We discriminatively identify the PL signatures of the rBN and tBN from those typical of the hexagonal (hBN) and Bernal stackings (bBN). The optical signature of tBN appears at 5.45 eV, and it intercalates between the two recombination bands typical of rBN at 5.35 eV (strong intensity) and 5.55 eV(weaker intensity). The analogs of the high intensity band at 5.35 eV in rBN sit at 5.47 eV for hBN and at 5.54 eV for bBN. [ABSTRACT FROM AUTHOR]

We determine the internal quantum efficiency of strain-balanced AlGaN-InGaN-GaN hetero-structures designed for yellow-amber light emission, by using a recent model based on the kinetics of the photoluminescence decay initiated by Iwata et al. [J. Appl. Phys. 117, 075701 (2015)]. Our results indicate that low temperature internal quantum efficiencies sit in the 50% range and we measure that adding an AlGaN layer increases the internal quantum efficiency from 50% up to 57% with respect to the GaN-InGaN case. More dramatic, it almost doubles from 2.5% up to 4.3% at room temperature. [ABSTRACT FROM AUTHOR]

The variation of the internal quantum efficiency (IQE) of single InGaN quantum well structures emitting from blue to red is studied as a function of the excitation power density and the temperature. By changing the well width, the indium content, and adding a strain compensation AlGaN layer, we could tune the intrinsic radiative recombination rate by changing the quantum confined Stark effect, and we could modify the carrier localization. Strong quantum confined Stark effect and carrier localization induce an increase in the carrier density and then favor Auger non-radiative recombination in the high excitation range. In such high excitation conditions with efficient Auger recombination, the variation of the IQE with the photo-excitation density P is ruled by a universal power law independent of the design: IQE=IQEMAX – a log10P with a close to 1/3. The temperature dependences of the different recombination mechanisms are determined. At low temperature, both quantum confined Stark effect and carrier localization trigger electron-electron repulsions and therefore the onset of the Auger effect. The increase in the value of coefficient C with changing temperature reveals indirect Auger recombination that relates to the interactions of the carriers with other phonons than the longitudinal optical one. [ABSTRACT FROM AUTHOR]