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Bond-orientational order in DNA-assembled nanoparticles lattices is explored with the help of recently introduced Symmetry-specific Bond Order Parameters (SymBOPs). This approach provides a more sensitive analysis of local order than traditional scalar BOPs, facilitating the identification of coherent domains at the single bond level. The present study expands the method initially developed for assemblies of anisotropic particles to the isotropic ones or cases where particle orientation information is unavailable. The SymBOP analysis was applied to experiments on DNA-frame-based assembly of nanoparticle lattices. It proved highly sensitive in identifying coherent crystalline domains with different orientations, as well as detecting topological defects, such as dislocations. Furthermore, the analysis distinguishes individual sublattices within a single crystalline domain, such as pair of interpenetrating FCC lattices within a cubic diamond. The results underscore the versatility and robustness of SymBOPs in characterizing ordering phenomena, making them valuable tools for investigating structural properties in various systems. [ABSTRACT FROM AUTHOR]

We have developed a next-generation scanning x-ray microscope RASMI (RApid Scanning Microscopy Instrument) for high-throughput tomographic imaging. RASMI is installed at the hard x-ray nanoprobe beamline at NSLS-II and is capable of manipulating 1D multilayer Laue lenses (MLLs) and 2D optics (both zone plates and monolithically assembled 2D MLLs). The sample scanning stage utilizes line-focusing interferometry as an encoder while performing fly-scanning data acquisition. The system can be configured for both position- and time-triggering modes during fly-scanning. The microscope demonstrated a detector-limited data acquisition rate of 1.25 kHz during ptychography measurements. The initial x-ray results yielded a sample-limited resolution of ∼6 nm in 2D. RASMI can be adopted for in-vacuum applications and is a foundation for the next-generation scanning microscopy systems to be developed and commissioned at NSLS-II. [ABSTRACT FROM AUTHOR]

We describe the evolution of the x-ray scattering pattern which forms on an area detector when a divergent, coherent nanobeam is diffracted from a perfect or weakly deformed single crystal. We show that the scattering can be considered as virtual diffraction from an angular aperture in reciprocal space; this is analogous to pinhole diffraction in real space. We define an angular Fresnel number, YA, which allows the categorization of the nanodiffraction image into near-field, intermediate-field, and far-field regimes. We provide equations for YA in simple geometries and show that dynamical scattering artifacts are eliminated through wave interference in the far-field image; this is the only regime where direct analysis of the charge coupled device image using geometrical formulae to transform distances to diffraction angles is possible. [ABSTRACT FROM AUTHOR]

We here report results of high resolution x-ray diffraction, x-ray reflectivity (XRR), as well as optical absorption and reflection measurements on ZnSe samples grown by molecular beam epitaxy, with insertion of planar (δ-) regions of both N as an acceptor dopant and Te as a “co-dopant” to facilitate a p-type doping. We note that to enhance the surface diffusion of Te, migration enhanced epitaxy was adopted in the growth of the “δ-layers;” i.e., Te is deposited in the absence of Zn flux. Structural parameters were extracted by simulating the experimental x-ray diffraction curves using a dynamical model. The results show that only the “δ-layers” (with submonolayer thickness) are rich in ZnTe, while the nominally undoped “spacers” have only a low Te concentration. Moreover, the morphology of the surface and interfaces are studied by XRR. Furthermore, the optical absorption and reflection results show that our samples largely preserve the optical properties of the host material (ZnSe). We note that our results, in particular those on the Te concentration, explain the observed good p-type doping of such samples. [ABSTRACT FROM AUTHOR]

A multilayer Laue lens (MLL) is an x-ray focusing optic fabricated from a multilayer structure consisting of thousands of layers of two different materials produced by thin-film deposition. The sequence of layer thicknesses is controlled to satisfy the Fresnel zone plate law and the multilayer is sectioned to form the optic. An improved MLL geometry can be created by growing each layer with an in-plane thickness gradient to form a wedge, so that every interface makes the correct angle with the incident beam for symmetric Bragg diffraction. The ultimate hard x-ray focusing performance of a wedged MLL has been predicted to be significantly better than that of a nonwedged MLL, giving subnanometer resolution with high efficiency. Here, we describe a method to deposit the multilayer structure needed for an ideal wedged MLL and report our initial deposition results to produce these structures. [ABSTRACT FROM AUTHOR]

We report a process to fabricate multilayer Laue lenses (MLL’s) by sectioning and thinning multilayer films. This method can produce a linear zone plate structure with a very large ratio of zone depth to width (e.g., >1000), orders of magnitude larger than can be attained with photolithography. Consequently, MLL’s are advantageous for efficient nanofocusing of hard x rays. MLL structures prepared by the technique reported here have been tested at an x-ray energy of 19.5 keV, and a diffraction-limited performance was observed. The present article reports the fabrication techniques that were used to make the MLL’s. [ABSTRACT FROM AUTHOR]

The authors report experimental data and modeling results for reflection microbeam x-ray topographs from a Si substrate strained by an overlying pseudomorphic SiGe film edge. The diffracted x-ray intensity from the Si substrate is strongly asymmetric as a function of distance from the film edge. A model of the diffracted intensity based on the classical Ewald–von Laue dynamical diffraction theory for an antisymmetric strain distribution indicates that the asymmetry in the diffracted beam profile is only due to the scattering process; individual intensity maxima in the intensity profile cannot be uniquely ascribed to individual features in the local strain distribution. [ABSTRACT FROM AUTHOR]