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SrIrO3 (SIO) thin films were epitaxially grown on (001)-oriented 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 (PMN-PT) single-crystal substrates. Upon applying electric fields to the piezoelectric PMN-PT along the thickness direction, the electronic transport properties of SIO films can be in situ tuned and modulated by non-180° ferroelectric domain rotation-induced strain, piezoelectric strain, and rhombohedral-to-tetragonal structural phase transition-induced strain in the PMN-PT layer, respectively. Moreover, the weak negative magnetoresistance (MR) of the 60-nm SIO films could be modified by applying an electric field to the PMN-PT layer. At T = 2 K, upon the application of E = 4 kV/cm to the PMN-PT, MR at H = 9 T is reduced by 14.2% as compared to that under zero electric field, indicating in-plane compressive strain-induced suppression of the influence of quantum corrections to the conductivity in the SIO film. These results demonstrate that the electric-field controllable lattice strain is a simple approach to get insight into the strain-property relationships of 5d iridate thin films. [ABSTRACT FROM AUTHOR]

NiO–Ni composite films were heteroepitaxially grown on (111)-oriented ferroelectric 0.31Pb(In1/2Nb1/2)O3-0.35Pb(Mg1/3Nb2/3)O3-0.34PbTiO3 (PIN-PMN-PT) single-crystal substrates by pulsed laser deposition. The NiO films prepared in high vacuum are n-type conducting and possess room-temperature ferromagnetism, which originates from oxygen vacancies and the presence of the second Ni phase, respectively. Taking advantage of the electric-field-induced ferroelectric polarization charges, we realized in situ reversible and nonvolatile modulation of both the electrical resistance and magnetism of the film. A relative resistance change of ∼470% is obtained at room temperature, while an appreciable magnetization change of ∼15% was achieved at 50 K by switching the polarization states of PIN-PMN-PT. The coexistence of charge-density-tunable electronic and magnetic properties of NiO–Ni/PIN-PMN-PT heterostructures may provide a strategy to design charge-mediated multiferroic devices for nonvolatile memory and spintronic applications. [ABSTRACT FROM AUTHOR]

Electric-field switchable multilevel nonvolatile resistance states are achieved at room temperature in Bi0.93Sb0.07/0.71Pb(Mg1/3Nb2/3)O3-0.29PbTiO3(111) (PMN-0.29PT) heterostructures. During the initial poling of the PMN-0.29PT, the variation of the resistance of the Bi0.93Sb0.07 film with the electric field tracks the variation of the electric-field-induced in-plane strain of the PMN-0.29PT effectively, revealing that the resistance switching is dominated by the ferroelectric-domain-switching-induced lattice strain but not the domain-switching-induced polarization charges. A relative resistance change ΔR/R ∼ 7% at 300 K and up to ∼10% at 180 K were achieved near the coercive field EC of the PMN-0.29PT(111) substrate. At least five stable resistance states with good endurance properties could be obtained at room temperature by precisely controlling the electric-field pulse sequence as a result of the nonvolatile remnant strain transferring from the PMN-0.29PT to the film, providing a simple and energy efficient way to construct multistate resistive memory. [ABSTRACT FROM AUTHOR]

We epitaxially grew 7 mol. % Nd-doped BaSnO3 (NBSO) thin films on double-side polished SrTiO3 (001) single-crystal substrates and optimized the oxygen pressure (PO2), substrate temperature (TS), and film thickness (t) to achieve excellent structural, optical, and electrical performance. By keeping TS (=800 °C) constant, NBSO films prepared at PO2 = 10 Pa show the best crystallization, yielding a full-width at half-maximum (FWHM) of the x-ray diffraction rocking curve of 0.079° and exhibiting a room-temperature resistivity (ρ) of ∼1.85 mΩ cm and a volume carrier density (n) of ∼8.5 × 1020/cm3. By keeping PO2 (=10 Pa) constant, the room-temperature ρ of NBSO films could be reduced to as low as 0.5 mΩ cm by increasing TS from 700 to 825°; meanwhile, the volume carrier density and mobility show the maximum of 5.04 × 1020/cm3 and 24.9 cm2/Vs, respectively, for TS = 825 °C. For all as-grown NBSO thin films, the optical transmittance in the visible wavelength region is larger than 80%. The optimized comprehensive properties of the NBSO films with FWHM = 0.11°, ρ = 0.5 mΩ cm, μ = 24.9 cm2/Vs, and T > 80% are superior to those of other rare-earth and 4d- and 5d-transition metal-doped BaSnO3 thin films. [ABSTRACT FROM AUTHOR]

The authors inadvertently used the unit "Oersted (Oe)" of the magnetic field instead of the correct unit "Tesla (T)." The sentence "On one hand, the greater difference of I M i SB S sb can be ascribed to the larger absolute difference in carrier density (7.6 × 10 SP 18 sp cm SP -3 sp ) between the two polarization states (Fig. S3, supplementary material), as compared with the corresponding value at 300 K (1.19 × 10 SP 18 sp cm SP -3 sp )." should be corrected as "On one hand, the greater difference of I M i SB S sb can be ascribed to the larger absolute difference in carrier density (7.6 × 10 SP 22 sp cm SP -3 sp ) between the two polarization states (Fig. [Extracted from the article]

SrIrO3 (SIO) thin films were epitaxially grown on (001)-oriented 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 (PMN-PT) single-crystal substrates. Upon applying electric fields to the piezoelectric PMN-PT along the thickness direction, the electronic transport properties of SIO films can be in situ tuned and modulated by non-180° ferroelectric domain rotation-induced strain, piezoelectric strain, and rhombohedral-to-tetragonal structural phase transition-induced strain in the PMN-PT layer, respectively. Moreover, the weak negative magnetoresistance (MR) of the 60-nm SIO films could be modified by applying an electric field to the PMN-PT layer. At T = 2 K, upon the application of E = 4 kV/cm to the PMN-PT, MR at H = 9 T is reduced by 14.2% as compared to that under zero electric field, indicating in-plane compressive strain-induced suppression of the influence of quantum corrections to the conductivity in the SIO film. These results demonstrate that the electric-field controllable lattice strain is a simple approach to get insight into the strain-property relationships of 5d iridate thin films. [ABSTRACT FROM AUTHOR]