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Vanadium dioxide (VO2) is a phase transition material that undergoes a reversible insulator-metal phase transition at ~ 68 C. Atmospheric pressure thermal oxidation (APTO) of vanadium (V) is a simple VO2 synthesis method in which V thin film is oxidized in open air. For an optimum oxidation duration, VO2 films are obtained with good phase transition properties. We recently reported a modified APTO process using a step temperature profile for oxidation (Thin Solid Films 706, 138003 (2020)). We demonstrated an ultra-low thermal budget synthesis of VO2 thin films with good electrical and optical phase transition properties. For a 130 nm room-temperature RF sputtered V thin film, an optimum oxidation duration of ~ 30 s was obtained. In this work, we study how the starting V film thickness and deposition temperature affects the optimum oxidation duration. V thin films of varying thickness (15-212 nm) and 120 nm thick V films with varying deposition temperature (~27-450 C) are prepared using RF magnetron sputtering. These films are oxidized for different oxidation durations and characterized using Raman and four-probe measurements to find the optimum oxidation duration for each deposition condition. We find that the optimum oxidation duration increases with the increase in V film thickness and V deposition temperature. We model the effect of V film thickness and deposition temperature on the optimal oxidation time using a parabolic law which can be used to obtain the optimal oxidation times for intermediate V thicknesses/deposition temperatures., Comment: 17 pages, 6 figures

Side-channel attacks have empowered bypassing of cryptographic components in circuits. Power side-channel (PSC) attacks have received particular traction, owing to their noninvasiveness and proven effectiveness. Aside from prior art focused on conventional technologies, this is the first work to investigate the emerging negative capacitance transistor (NCFET) technology in the context of PSC attacks. We implement a CAD flow for the PSC evaluation at design time. It leverages industry-standard design tools, while also employing the widely accepted correlation power analysis (CPA) attack. Using standard-cell libraries based on the 7-nm FinFET technology for NCFET and its counterpart CMOS setup, our evaluation reveals that NCFET-based circuits are more resilient to the classical CPA attack, due to the considerable effect of negative capacitance on the switching power. We also demonstrate that the thicker the ferroelectric layer, the higher the resiliency of the NCFET-based circuit, which opens new doors for optimization and tradeoffs.

Two dimensional magnetic materials, with tunable electronic properties could lead to new spintronic, magnetic and magneto-optic applications. Here, we explore intrinsic magnetic ordering in two dimensional monolayers of transition metal tri-halides (MX$_3$, M = V, Cr, Mn, Fe and Ni, and X = F, Cl, Br and I), using density functional theory. We find that other than FeX$_3$ family which has an anti-ferromagnetic ground state, rest of the trihalides are ferromagnetic. Amongst these the VX$_3$ and NiX$_3$ family are found to have the highest magnetic transition temperature, beyond the room temperature. In terms of electronic properties, the tri-halides of Mn and Ni are either half metals or Dirac half metals, while the tri-halides of V, Fe and Cr are insulators. Among all the trihalides studied in this paper, we find the existence of very clean spin polarized Dirac half metallic state in MnF$_3$, MnCl$_3$, MnBr$_3$, NiF$_3$ and NiCl$_3$. These spin polarized Dirac half metals will be immensely useful for spin-current generation and other spintronic applications.

In this article, we explore the anisotropic electron energy loss spectrum (EELS) in monolayer phosphorene based on ab-initio time dependent density functional theory calculations. Similar to black phosphorous, the EELS of undoped monolayer phosphorene is characterized by anisotropic excitonic peaks for energies in vicinity of the bandgap, and by interband plasmon peaks for higher energies. On doping, an additional intraband plasmon peak also appears for energies within the bandgap. Similar to other two dimensional systems, the intraband plasmon peak disperses as $\omega_{\rm pl} \propto \sqrt{q}$ in both the zigzag and armchair directions in the long wavelength limit, and deviates for larger wavevectors. The anisotropy of the long wavelength plasmon intraband dispersion is found to be inversely proportional to the square root of the ratio of the effective masses: $\omega_{\rm pl}(q \hat{y})/\omega_{\rm pl}(q \hat{x}) = \sqrt{m_x/m_y}$., Comment: 10+ pages with 8 figures