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Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass.