10 results on '"Boullart, W."'
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2. Dry etching fin process for SOI finFET manufacturing: Transition from 32 to 22 nm node on a 6T-SRAM cell
3. In-line control of Si loss after post ion implantation strip
4. Effect of top power on a low- k film during oxygen strip in a TCP etch chamber
5. Dry etching process for bulk finFET manufacturing
6. High aspect ratio via etch development for Cu nails in 3-D-stacked ICs
7. Diffusion of solvents in thin porous films
8. Spacer defined FinFET: Active area patterning of sub-20 nm fins with high density
9. Characterisation and integration feasibility of JSR’s low- k dielectric LKD-5109
10. Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
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