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Abstract: The silicon nitride/diamond-like carbon composites were fabricated using co-deposition sources. The RF magnetron was used to deposit silicon nitride simultaneously with cathodic arc deposition of carbon. The condition of RF magnetron sputtering for silicon nitride was fixed at 0.6mTorr, RF power 200 watts and 100 watts to maintain deposition rate of silicon nitride. The arc current was conditionally manipulated in this study to vary carbon deposition rate, resulting a change in composite ratio between two materials. Raman characterization and mechanical properties such as film stress and hardness were discussed as a function of deposition rate ratio. It was found that the variation of film stress follows carbon deposition rate. The Raman spectra show that the G-peak position shift to the lower wavenumber while decreasing arc current and deposition rate of carbon. [Copyright &y& Elsevier]