1. RBS/C and TEM characterization of GaN nanolayer obtained by IBS on (001) GaAs.
- Author
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Coelho-Júnior, H. and Maltez, R.L.
- Subjects
- *
RUTHERFORD backscattering spectrometry , *AUDITING standards , *RAPID thermal processing , *TRANSMISSION electron microscopy , *SPUTTER deposition , *HEAVY ions - Abstract
Abstract Rutherford Backscattering Spectrometry in random (RBS) and aligned (RBS/C) to GaAs 001 -channel, and Transmission Electron Microscopy (TEM) techniques were employed to characterize the GaN nanolayer obtained by Ion Beam Synthesis (IBS). N+ ions at 50 keV were implanted up to a fluence of 3 × 1017 cm−2 into a 001 GaAs substrate capped by 125 nm Si 3 N 4 layer obtained by sputtering deposition. N+ implantation was performed with samples held at 450 °C, which were subsequently annealed in a temperature range between 550 and 1000 °C for 5 min by Rapid Thermal Annealing (RTA) under N 2 flow. TEM demonstrated a layered structure on the as-implanted sample, with N bubbles formed at around Si 3 N 4 /GaAs interface. RBS/C analysis carried out on samples annealed at distinct temperatures revealed a threshold temperature of about 850 °C to fully convert the as-implanted layered structure into a GaN nanolayer. At this temperature and above, the GaAs implanted side of the former Si 3 N 4 /GaAs interface was converted into GaN. As a result, an underneath voids structure was also formed indicating an intense migration of Ga from deeper areas of the GaAs substrate. RBS showed results compatible with a GaN nanolayer rich in N for the 850 °C annealing, whose sample also offered canalization (χ min = 63%) along the GaAs 001 -channel. However, a regression in the crystalline quality (χ min = 95%) was observed for the 1000 °C anneal. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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