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To obtain a high-quality AlN template on a Si substrate for high-quantum efficiency AlGaN-based deep-UV LED applications, we fabricated a high-density micro-patterned Si(111) substrate. An about 8-µm-thick AlN template was grown on the Si(111) substrate in a metal-organic chemical vapor deposition reactor by using NH 3 pulsed-flow multilayer AlN growth and epitaxial lateral overgrowth methods. The template had a small X-ray full width at half-maximum with rocking curves of 620 and 1141″ for the symmetric and asymmetric (002 and 102) planes. A threading dislocation density at the best region as low as 10 7 cm −2 was also obtained. [ABSTRACT FROM AUTHOR]

• New developments about the electron-blocking mechanism in the UVB LED. • Al-graded AlGaN electron-blocking and p-AlGaN hole-source layers are implemented. • Efficiency droop at 500 mA is remarkably suppressed. • The operating voltages at 150 mA are significantly reduced from 64 to 24 V. • High IQE and high hole injection efficiency are confirmed in the UVB LED. Aluminum gallium nitride (AlGaN) based UVB LEDs are delivering an increase in efficiency under low current drive, however, the devices are confronted with high efficiency droop and high operating voltages during the measurement on bare-wafer under high current drive. Such issues in UVB LEDs are attributed to using conventional p-type multi-quantum-barrier electron-blocking layer (p-MQB EBL) and fixed Al-contents in the p-AlGaN hole-source layer (HSL). When the conventional p-MQB EBL and bulk p-AlGaN HSL was replaced by Al-graded ud-AlGaN EBL and Al-graded p-AlGaN HSL, respectively, the efficiency droop has been remarkably suppressed and almost uniform external-quantum efficiency (EQE) under high injection current was confirmed. Also, the operating voltages under 150 mA drive were significantly reduced from 64 V (conventional p-MQB EBL) to 24 V (new polarized ud-AlGaN EBL) in UVB LEDs. These improvements are attributed to the smooth valance band edge without any potential barrier in both Al-graded ud-AlGaN EBL and Al-graded p-AlGaN HSL for efficient injection efficiency. At the same time the new structure was considered useful for both blocking of high energy electron overshooting toward the p-side as well as Mg-diffusion toward the multi-quantum wells (MQWs) under high current drive. These experimental results were also confirmed by simulations. [ABSTRACT FROM AUTHOR]

Previously, we attempted to the optically-pumped AlGaN ultraviolet (UV) laser diodes (LDs) on AlN template on c-Sapphire substrate, using low-cost epitaxial growth technique in low-pressure metalorganic vapor-phase epitaxy (LP-MOVPE). As a result, stimulated lasing spectra at 274 nm were observed for the first time at room temperature (RT) in the optically pumped LD. However, the electrically-pumped AlGaN-based (270–298 nm)-band UV LD was quite challenging due to both the issue of low injection current density and light confinement factor (Г). In this paper, the injection current density in the electrically pumped AlGaN UV LD at 283 nm emission was remarkably improved up to 200 kA-cm−2 by using undoped Al-graded cladding and Al-graded Mg-doped p-AlGaN hole source layer (HSL). Also, some weak oscillation at 296 nm near to the main spontaneous emission peak of 298 nm-band LD under the 600 mA (24 V) current using pulse width of 50 ns at RT was observed. To further improve the lasing phenomenon, some theoretical studies was conducted, by making the p-side waveguide (p-WG) layer non-doped (Mg = 0) and also increasing the quantum-well (QW) thickness from 2 nm to 4 nm in the multiquantum-wells (MQWs). Consequently, the optical-loss was significantly reduced from 22.7 to 8.7 cm−1 and the Г was enhanced from 1.77% (Experimental LD) to 4.65% (simulated LD). • Optically-pumped AlGaN ultraviolet (UV) laser diodes (LDs) on low-cost AlN template on c-Sapphire substrate in low-pressure metalorganic vapor-phase epitaxy (LP-MOVPE) was realized. • Stimulated lasing spectra at 274 nm were observed at room temperature (RT) in the optically pumped UV LD. • Electrically pumped UV LD was also attempted. The injection current density in the electrically pumped AlGaN UV LD at 283 nm emission was remarkably improved up to 200 kA-cm−2. • Some weak oscillation at 296 nm near the main spontaneous emission peak of 298 nm-band UV LD under injection current of 600 mA (24 V) was observed using pulse width of 50 ns at RT. • The optical-loss was significantly reduced from 22.7 to 8.7 cm−1 and light confinement factor (Г) was remarkably enhanced from 1.77% (Experimental UV LD) to 4.65% (simulated UV LD). [ABSTRACT FROM AUTHOR]

Highlights • GaN-based THz-QCL active region was grown by MOCVD on Si substrate. • A GaN/AlGaN QC active layer consisting of two-QW for one-period was grown. • Samples were evaluated by HR-XRD and cross-sectional TEM. • FWHM of the XRD satellite peaks became narrower when growth temperature decreased. Abstract GaN/AlGaN THz quantum-cascade laser (QCL) structures were grown on AlGaN/Si templates by a metal-organic chemical vapor deposition (MOCVD). We aim to fabricate a double metal waveguide (DMW) based GaN THz QCL through removing the Si substrate by wet etching. The DMW is essential for realizing low cavity loss and a very high optical confinement factor (99%). We grew 100 periods of GaN/Al 0.21 Ga 0.79 N two quantum wells (QW) type active region on Al 0.08 Ga 0.92 N/Si templates. Samples were evaluated by cross-sectional transmission-electron microscopy (TEM) and high-resolution X-ray diffraction (HR-XRD). We found that the full width at half maximum (FWHM) of the XRD satellite peaks became narrower when the growth temperature decreased, and the steepness of the QC layer hetero-interfaces has been improved. [ABSTRACT FROM AUTHOR]

Highlights • The crystalline quality improved with increasing the annealing temperature. • The crystalline quality was improved by further growth of AlN. • Decreased anisotropy of XRC implies a reduction in the density of stacking faults. Abstract AlGaN light-emitting diodes (LEDs) have been studied for their use as highly efficient light sources in the deep ultraviolet (DUV) region. The spontaneous and piezoelectric polarization in c -plane AlGaN, produces a strong electric field, which degrades the performance of LEDs. To overcome this polarization problem, growth on less widely used substrates, such as those with semipolar/nonpolar orientations has been carried out. However, the expected improvements have not been forthcoming for AlGaN alloys in the DUV region because of the poor crystallinity obtained. Here, we report on the improved crystallinity of semipolar AlN grown on m -plane sapphire using a high-temperature annealing process. For (10-1-3) and (11-22) AlN layers grown on m -plane sapphire, the crystal quality improved with increasing annealing temperature up to 1700 °C. The crystallinity of (11-22) AlN layer was further improved by further growth of AlN. A best FWHM of 280arcsec was obtained for a 3-μm thick (11-22) AlN layer grown after high-temperature annealing. [ABSTRACT FROM AUTHOR]

• ELO-AlN was performed by varying off-cut angle of sapphire using MOVPE. • Dislocations were reduced by increasing off-cut angle of sapphire substrate. • Increasing off-cut angle, low dislocation region of ELO became smaller. • ELO-AlN layer exhibited low dislocation density of 2.1 × 106cm−2. Using a metal–organic vapor phase epitaxy, the epitaxial lateral overgrowth (ELO) of AlN was performed by varying a vicinal off-cut angle from 0.15 to 2.0° of sapphire substrates oriented to the m -axis, i.e., the a -axis of AlN. During overgrowth, step bunching resulted in the efficient conversion of dislocations to elongated voids. The dislocations were terminated at the voids formed over the groove regions and the low and high etch pit density (EPD) regions were observed. The dislocation was reduced by increasing the off-cut angle of the sapphire substrates up to 0.8°; however, low-EPD region became small in the ELO. Thus, we have attempted to achieve a longer growth of the ELO-AlN layer on the sapphire substrate with the off-cut angle of 0.15°. As a result, the EPD decreased with the increasing thickness. The ELO-AlN layer with the thickness of 15.9 µm exhibited the EPD of 2.1 × 106 cm−2 in the low dislocation region. [ABSTRACT FROM AUTHOR]

Nonradiative recombination (NRR) processes through defect states and their temperature dependence in UV-B AlGaN MQW sample on sapphire substrate grown by MOCVD technique have been studied by photoluminescence (PL) spectroscopy. We detected NRR centers by adding a below-gap excitation light with photon energies from 0.93 eV to 1.46 eV on an above-gap excitation light of 4.66 eV. All the BGE energies decreased PL intensity at 25 K, and the most-distinct quenching is observed by 1.27 eV BGE at the same BGE photon number density. The temperature-dependent PL intensity for the BGE energy of 1.27 eV is interpreted by three NRR centers. The one-level model dominates over that of two-level model in the temperature range 58 K < T < 88 K. The two-level model prevails in other region of temperature. The combination of one-level and two-level models is consistent with the spectral peak-energy shift as a function of temperature. • Investigates NRR processes in UV-B AlGaN MQW by adding below-gap excitation light. • Detects NRR centers by observing PL-intensity change due to below-gap excitation. • Identifies correlation of T -dependent NRR processes with T -dependent PL peak-energy. • Interpret T -dependent NRR processes by a model based on SRH statistics. [ABSTRACT FROM AUTHOR]

Novel 1H,6H-pyranyl[4,3-c][2]benzopyrane-1,6-diones, meshimakobnol A and B, were isolated from natural Phellinus linteus fruit body. The structure elucidation of these fused aromatic compounds was achieved by a spectroscopic method including the measurement of FG-HMBC with various delay times. [Copyright &y& Elsevier]