8 results on '"Mitsuhashi, R."'
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2. 45nm LSTP FET with FUSI Gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
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3. Comparison of thermal and plasma oxidations for HfO 2/Si interface
4. Optimization of HfSiON using a design of experiment (DOE) approach on 0.45V V t Ni-FUSI CMOS transistors
5. 45nm LSTP FET with FUSI Gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
6. RHEED-ISS study on the [formula omitted] surface at high temperature
7. Achieving low-V T Ni-FUSI CMOS via lanthanide incorporation in the gate stack
8. Comparison of thermal and plasma oxidations for HfO2/Si interface
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