1. The Impact of N2 Anneal on Laser Processed Silicon.
- Author
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Xu, Lujia, Weber, Klaus, Yang, Xinbo, Fell, Andreas, and Franklin, Evan
- Abstract
In this paper, the impact of the N 2 anneal on laser processed silicon was investigated using photoluminescence (PL) imaging through comparing the PL signal of laser processed samples before and after N 2 anneal. The samples capped with different dielectrics or without any dielectric (bare surface) prior to the laser processing were used, enabling the evaluation of the influence of the N 2 anneal on the defects caused both by laser thermal effect and by the existence of dielectrics. Generally, it was found that N 2 anneal is an effective way to reduce both the laser and dielectric induced defects. [ABSTRACT FROM AUTHOR]
- Published
- 2015
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