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A simple method for replicating metallic stamp from original masters via combined nanoimprint and electroforming is presented. In this work we demonstrate the generality of the method by replicating structures with dimensions ranged from several microns to sub-100nm in large patterned area. The structures were transferred first into an intermediate polymer sheet (IPS) with good uniformity and high structural fidelity, and then this IPS was used as the galvano-template for nickel electroforming. The major advantage of the method relies on the pattern transfer occurred between a soft polymer and the hard master, thereby the risk of damaging the mold is extremely low.

Nanoimprint lithography (NIL) has developed from an emerging nanoreplication technology into a mature and industrially viable manufacturing technology. It is now by far the fastest and most cost-efficient nanoreplication method available. This technology has been successfully implemented in the manufacturing of High Brightness LED's. However, manufacturing of HBLED's in high volume using nanoimprint lithography faces a few particular challenges. Perhaps the most significant is to produce perfectly imprinted nanostructures on the epitaxially grown substrates with high quality and yield. This is especially important since the substrates are expensive and since the imprint step is close to the end of the production process. This means that the value of the processed substrates is very high. In this work, 8000 imprints were produced. Measured data from the imprinted substrates shows consistent results. It is also shown that the 8000 imprints have been performed using the same stamp without significant degradation. After 8000 imprints, the yield from the nanoimprint lithography step is 99.15%.

A complete nanobiosensor structure consisting of a 200 @mm x 200 @mm area containing 100 nm sized interdigitated nanoelectrodes with varied interelectrode distances has been fabricated using nanoimprint lithography (NIL) in combination with UV-lithography. The complete structure has been characterized with admittance spectroscopy. In the paper are discussed the needs and key issues for nanosensors and the capability offered by using NIL for fabrication of such sensors.