41 results on '"Blanquet, E."'
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2. Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
3. HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process
4. Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy
5. Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer
6. Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam
7. High temperature chemical vapor deposition of aluminum nitride, growth and evaluation
8. New method to evaluate materials outgassing used in MEMS thin film packaging technology
9. Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature
10. Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C
11. Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy
12. Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process
13. Experimental study of uranium carbide pyrophoricity
14. High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiC
15. Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation
16. Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices
17. Experimental thermodynamics for the evaluation of ALD growth processes
18. Thermodynamic and experimental study of UC powders ignition
19. Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVD
20. XPS studies of the ALD-growth of TaN diffusion barriers: Impact of the dielectric surface chemistry on the growth mechanism
21. Chemical vapor deposition of thin films and coatings: Evaluation and process modeling
22. Chlorinated silicon carbide CVD revisited for polycrystalline bulk growth
23. Silicon nanostructures for DNA biochip applications
24. DNA microarrays on silicon nanostructures: Optimization of the multilayer stack for fluorescence detection
25. High temperature processing of poly-SiC substrates from the vapor phase for wafer-bonding
26. Density functional study of the stability and electronic properties of TaxNy compounds used as copper diffusion barriers
27. Modeling and simulation of SiC CVD in the horizontal hot-wall reactor concept
28. Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization
29. Application of equilibrium thermodynamics to the development of diffusion barriers for copper metallization (invited)
30. State of the art in the modelling of SiC sublimation growth
31. Modelling of SiC sublimation growth process: analyses of macrodefects formation
32. LPCVD and PACVD (Ti,Al)N films: morphology and mechanical properties
33. Les différentes voies de modélisation macroscopique du procédé de dépôt de SiC par voie gazeuse
34. Macroscopic modelling of silicon carbide sublimation: toward a microscopic modelling of defect formation
35. Defects formation in sublimation grown 6H-SiC single crystal boules
36. Different macroscopic approaches to the modelling of the sublimation growth of SiC single crystals
37. LPCVD RexSiyNz diffusion barriers in Si/SiO2/Cu metallizations
38. A thermodynamic and experimental approach to ReSi2 LPCVD
39. A thermodynamic and experimental approach to TaSi2 chemical vapour deposition
40. Chemical vapor deposition of refractory metal silicides
41. A thermodynamic evaluation of four Si-M (M = Mo, Ta, Ti, W) binary systems
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