6 results on '"Mitsuhashi, R."'
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2. Optimization of HfSiON using a design of experiment (DOE) approach on 0.45V Vt Ni-FUSI CMOS transistors
3. PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP application
4. 45nm LSTP FET with FUSI Gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
5. Comparison of thermal and plasma oxidations for HfO2/Si interface
6. RHEED-ISS study on the surface at high temperature
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