8 results on '"Partel S"'
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2. Novel fabrication process for sub-micron interdigitated electrode arrays for highly sensitive electrochemical detection
3. Simulation model validation of two common i-line photoresists
4. Mask aligner lithography simulation – From lithography simulation to process validation
5. Fabrication process development for a high sensitive electrochemical IDA sensor
6. Contact and proximity lithography using 193nm Excimer laser in Mask Aligner
7. Optimization of illumination pupils and mask structures for proximity printing
8. Investigation of high-resolution contact printing
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