1. A Robust Metal Oxide Thin Film with Cryogenic Saturation Magnetization Exceeding 2 Tesla
- Author
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Claudia Cancellieri, Roland Hauert, Ye Tao, and Kai Trepka
- Subjects
Materials science ,business.industry ,Magnetism ,chemistry.chemical_element ,Coercivity ,Magnetic susceptibility ,chemistry ,Remanence ,Physical vapor deposition ,Optoelectronics ,General Materials Science ,Thin film ,Magnetic force microscope ,business ,Holmium - Abstract
Summary High saturation magnetization, hysteresis-less long linear response range, and resistance to device fabrication conditions are figures of merit for magnetic materials. Despite advances in materials research, many high-saturating micro- and nanomagnetic materials are hysteresis-prone, have short linear ranges, and are sensitive to oxidation, resulting in device inefficiencies in high-frequency electronics and unpredictable responses in magnetic sensing applications. Holmium oxide is a promising material because of its high magnetic susceptibility, but synthetic options are limited, with low-temperature magnetism incompletely characterized. Here, we present physical vapor deposition synthesis and material characterization of polycrystalline holmium oxide thin films. The product has saturation magnetization exceeding 2 Tesla, linear range (μ0H) also exceeding 2 Tesla, zero magnetic remanence and coercivity, and resistance to harsh processing conditions including oxygen plasma and concentrated hydrofluoric acid etching, making these thin films ideal for fabricating next-generation nanoscale magnetic devices in advanced scientific and engineering applications. more...
- Published
- 2020
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