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20. Measurement of thin film thickness by means of a simple non-destructive radioisotopic technique

Author

G.Schirripa Spagnolo, G. Luzzi, A. Neri, M. Salmi, A. Mazzel, Luzzi, G, Mazzei, A, Neri, A, Salmi, M, and SCHIRRIPA SPAGNOLO, Giuseppe

Subjects
Materials science, business.industry, Calibration curve, thin film thickne, Resolution (electron density), radioisotopic technique, Metals and Alloys, Surfaces and Interfaces, engineering.material, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, NDT, Optics, Coating, Nondestructive testing, Materials Chemistry, Calibration, engineering, Gas detector, Thin film, business, Quartz
Abstract

A simple quick and cheap technique for the measurement of thin metallic film thicknesses is described. The intrinsic resolution of the method is not as high as those of other techniques but its simplicity is very appreciable. Several samples, which were obtained by the vacuum depostion of nickel, chromium and zinc and which were accurately measured using a quartz microbalance system, were used to test the method. The films were successively examined with a radioisotopic gas detector X-ray fluorescence apparatus, producing several calibration curves. The results so far obtained show that with the aid of such a calibration the rough estimation of an unknown coating thickness is a very quick and easy task.

Published
1980
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