1. Extraction of Ultra-Low Contact Resistivity by End-Resistance Method
- Author
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Bing-Yue Tsui, Mei-Yi Li, Ya-Hsin Lee, Dong-Ying Wu, and Yao-Jen Lee
- Subjects
010302 applied physics ,Materials science ,Distribution (mathematics) ,Condensed matter physics ,Electrical resistivity and conductivity ,Test structure ,0103 physical sciences ,Contact resistance ,Extraction (chemistry) ,02 engineering and technology ,021001 nanoscience & nanotechnology ,0210 nano-technology ,01 natural sciences - Abstract
Accuracy of extracting ultra-low contact resistivity by the end-resistance method is evaluated. As the contact length becomes smaller than the transfer length, the end-resistance approaches the contact resistance, and the error decreases with the reduction of contact length and contact resistivity. The contact resistivity lower than $10^{-9}\Omega-\mathrm{c}\mathrm{m}^{2}$ can be extracted with accuracy lower than $3\times 10^{-10}\Omega-\mathrm{c}\mathrm{m}^{2}$. This end-resistance method is verified by self-aligned transmission line model test structure. Statistic analysis of the distribution of contact resistance and the uniformity of the contact interface are also demonstrated.
- Published
- 2020