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4. Unexpected mobility degradation for very short devices : A new challenge for CMOS scaling

Author

Cros, Antoine, primary, Romanjek, Krunoslav, additional, Fleury, Dominique, additional, Harrison, Samuel, additional, Cerutti, Robin, additional, Coronel, Philippe, additional, Dumont, Benjamin, additional, Pouydebasque, Arnaud, additional, Wacquez, Romain, additional, Duriez, Blandine, additional, Gwoziecki, Romain, additional, Boeuf, Frederic, additional, Brut, Hugues, additional, Ghibaudo, Gerard, additional, and Skotnicki, Thomas, additional

Published
2006
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5. Automatic Extraction Methodology for Accurate Measurements of Effective Channel Length on 65-nm MOSFET Technology and Below.

Author

Fleury, Dominique, Cros, Antoine, Romanjek, Krunoslav, Roy, David, Perrier, Franck, Dumont, Benjamin, Brut, Hugues, and Ghibaudo, Gérard

Subjects
METAL oxide semiconductor field-effect transistors, FIELD-effect transistors, METAL oxide semiconductors, SEMICONDUCTORS, SEMICONDUCTOR industry
Abstract

The length of MOSFET channels is an important circuit design parameter, and this paper focuses on a new industrially-compatible technique using gate-to-channel measurements Cgc(Vg) to provide accurate extraction of the channel length. Thanks to fully-automatic probers, the technique provides large scale extractions and so, statistical-based results can be extracted with a maximized reliability. An in-depth study of parasitic capacitances has been performed to improve the extraction accuracy to within a few nanometers. The proposed methodology has been upgraded to in-line monitoring tests and deployed in a 300-mm semiconductor manufacturing facility. The pertinence of accurate channel length extraction has finally been proved by experimental studies (hot carrier injection lifetime), validating the coherence and the reliability of this technique. [ABSTRACT FROM AUTHOR]

Published
2008
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