1. Optical-Damage-Resistant Highly Er^\bf 3+ -Doped Ti:Er:LiNbO\bf 3 Strip Waveguide.
- Author
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Zhang, De-Long, Han, Fang, Chen, Bei, Hua, Ping-Rang, Yu, Dao-Yin, and Pun, Edwin Yue-Bun
- Abstract
We report optical-damage-resistant Ti:Er:LiNbO3 strip waveguide with high diffusion-doped surface Er^3+ concentration. The waveguide was fabricated starting from a commercial X-cut congruent LiNbO 3 plate with a two-step technological process in sequence of simultaneous work of Er^3+ diffusion doping and Li-poor vapor transport equilibration treatment, and fabrication of 6-μm-wide Ti-diffused strip waveguide (Z-propagation). The waveguide retains still the LiNbO3 phase and has the waveguiding characteristics similar to the conventional Ti:LiNbO3 waveguide except with a larger loss due to the imperfection of waveguide. Secondary ion mass spectrometry study shows that the Er^3+ diffusion reservoir was exhausted and the profile is the desired Gaussian-type with a surface concentration 1.0 mol%, which is about two times larger than the value of conventional Ti:Er:LiNbO3 amplifier. Further optical characterization shows that the waveguide shows stable 1547 nm small-signal gain under the 980 nm pumping without serious photorefractive effect observed. An unsaturated gain 1.7 dB/cm is obtained for the available coupled pump power of 160 mW. With increased pump power, optimized Er ^3+ diffusion condition and degraded loss figure, a higher gain is expected. [ABSTRACT FROM PUBLISHER]
- Published
- 2014
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