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9. Impact of tantalum composition in TaC/HfSiON gate stack on device performance of aggressively scaled CMOS devices with SMT and strained CESL

15. Beam dignosis devices of a high power proton beam line facility

16. High-Performance FinFET with Dopant-Segregated Schottky Source/Drain

17. Improvement of Drive Current in Bulk-FinFET using Full 3D Process/Device Simulations

18. FinFET: the prospective multi-gate device for future SoC applications

19. Guideline for Low-temperature-operation Technique to Extend CMOS Scaling

41. Production of NbTi CICC's for SST-1 Project at IPR.

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