Search

Recent studies show disordered materials such as amorphous silicon (a-Si), in spite of their low mobility, can efficiently amplify photocurrent via carrier multiplication process. Detectors with a thin (~40nm) a-Si multiplication layer has demonstrated single photon sensitivity at high speed under room temperature. It is believed that the abundance of bandtail states that cause low mobility of the amorphous materials actually contribute to the detector’s superior performance because carrier impact ionization involving these states, which can be modeled by donor-acceptor pairs (DAPs), relax the k-selection rule of the many-body carrier multiplication process. Our paper presents a theoretical framework to calculate the carrier multiplication process in a-Si or other disordered materials involving DAPs. Our analysis also establishes the relations between detector characteristics and key parameters such as the density of band tail states, layer thickness, and applied electric field. DAP assisted carrier multiplication rate is computed first. Carrier multiplication coefficients for electrons and holes under given applied field are then calculated using a trial distribution function that satisfies both the continuity equation and the energy balance equation. Our analysis shows that thinner a-Si gives rise to higher multiplication efficiency than thicker a-Si because of its higher carrier kinetic energy when the layer thickness is shorter than the length of energy relaxation by phonon scattering. Using the calculated carrier multiplication coefficients, voltage dependent gain of the device is computed and the results agree well with the measured results of a-Si cycling excitation process (CEP) detectors. [ABSTRACT FROM AUTHOR]

Amorphous materials have low mobility due to their nature of disorder. Surprisingly, some disordered materials showed photocurrent amplification not by conventional photoconductive gain. Recently, amorphous Silicon (a-Si) photodiodes with thin a-Si layer (∼40 nm) have shown a gain-bandwidth product of over 2 THz with very low excess noise and also have been used as a gain media in a cascaded system with single photon sensitivity. To unveil the true gain mechanism, we performed theoretical modeling and numerical analysis along with experimental data at different frequencies. We show evidence of highly effective carrier multiplication process within a-Si as the primary gain mechanism, especially at high frequency. We also show presence of trap-induced junction modulation at much lower frequency. We modeled the gain mechanism in a-Si by solving the transport equations including dynamics of defect states and carrier multiplication via the local field model. We further justified the application of local field model for thin a-Si, based on the property that in a-Si, the mean-free path for energy relaxation is orders of magnitude greater than the mean-free-path for momentum relaxation. The analysis further suggests that the carrier multiplication process in thin a-Si can be much more efficient than in thick a-Si, even stronger than single crystalline Si in some cases. Although seemingly counter intuitive, this is consistent with the proposed cycling excitation process where the localized states in the bandtails of disordered materials such as a-Si relax the k-selection rule and increase the rate of carrier multiplication. [ABSTRACT FROM AUTHOR]