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12. 5.8-km 10-Gbps data transmission over a 120-GHz-band wireless link

15. A low power 40nm CMOS technology featuring extremely high density of logic (2100kGate/mm2) and SRAM (0.195μm2) for wide range of mobile applications with wireless system

17. A cost-conscious 32nm CMOS platform technology with advanced single exposure lithography and gate-first metal gate/high-k process

25. Controllability of flatband voltage in high-k gate stack structures - remarkable advantages of La/sub 2/O/sub 3/ over HfO/sub 2/

29. Physics of interfaces between gate electrodes and high-k dielectrics

31. Extraction of process-induced damage in low-k/Cu damascene structure

32. Universal theory of workfunctions at metal/Hf-based high-k dielectrics interfaces - guiding principles for gate metal selection

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