1. Batch fabrication of scanning microscopy probes for thermal and magnetic imaging using standard micromachining
- Author
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Martin Herman Siekman, Rolf Vermeer, Edin Sarajlic, M.Y. Delalande, Leon Abelmann, Hiroyuki Fujita, and R. Huijink
- Subjects
Materials science ,MEMS fabrication ,Nanowire ,Nanotechnology ,microfluidic components ,RF MEMS resonators ,Scanning probe microscopy ,chemistry.chemical_compound ,nanodevices ,physical sensors ,Microscopy ,IR-74287 ,METIS-271106 ,TST-uSPAM: micro Scanning Probe Array Memory ,Lithography ,EWI-18714 ,nanomaterials ,Energy harvesting ,optical MEMS ,Surface micromachining ,Biosensors ,Silicon nitride ,chemistry ,Chemical sensors ,Scanning ion-conductance microscopy ,electronics packaging ,medical sensors ,power MEMS ,TST-SMI: Formerly in EWI-SMI ,Actuators ,Microfabrication - Abstract
We present a process for batch fabrication of a novel scanning microscopy probe for thermal and magnetic imaging using standard micromachining and conventional optical contact lithography. The probe features an AFM-type cantilever with a sharp pyramidal tip composed of four freestanding silicon nitride nanowires coated by conductive material. The nanowires form an electrical cross junction at the apex of the tip, addressable through the electrodes integrated on the cantilever. The cross junction on the tip apex can be utilized to produce heat and detect local temperature changes or to serve as a miniaturized Hall magnetometer enabling, in principle, thermal and magnetic imaging by scanning the probe tip over a surface. We have successfully fabricated a first probe prototype with a nanowire tip composed of 140 nm thick and 11 μ m long silicon nitride wires metallized by 6 nm titan and 30 nm gold layers. We have experimentally characterized electrical and thermal properties of the probe demonstrating its proper functioning. ©2010 IEEE.
- Published
- 2010