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The potential for negative-capacitance field-effect transistors (NCFETs) to enhance the unity-current-gain cutoff frequency ${f}_{T}$ and ${g}_{m}{f}_{T}/{I}_{D}$ ratio through a technique that mitigates the impacts of extrinsic parasitic capacitances is investigated, where ${g}_{m}$ is the transconductance and ${I}_{D}$ is the dc drain current and where “extrinsic” refers to elements arising outside an “intrinsic” or core transistor structure. We explain the technique and show that NCFETs can provide significant gains in extrinsic ${f}_{T}$ and ${g}_{m}{f}_{T}/{I}_{D}$ from this mitigation effect. However, an inherent degradation of intrinsic ${f}_{T}$ needs to be addressed to maximize these benefits, and this degradation can be alleviated through channel-length scaling as well as supply- and threshold-voltage tuning. The relative influences of different extrinsic parasitic elements are also evaluated, and it is found that improvements to ${f}_{T}$ and ${g}_{m}{f}_{T}/{I}_{D}$ increase as extrinsic parasitic capacitance increases and decrease as extrinsic parasitic resistance increases. Overall, this work finds that NCFET structures are promising candidates to mitigate the impacts of extrinsic parasitics in aggressively scaled transistors for the next-generation RF applications. [ABSTRACT FROM AUTHOR]

We propose a parallel negative-capacitance field-effect transistor (P-NCFET) structure, in which a ferroelectric operating in its negative-capacitance region is placed in parallel with the gate and source terminals of a MOSFET. The P-NCFET is stabilized by combining careful matching of the ferroelectric with the gate capacitance along with simple feedback realized using current mirrors. The novel stabilization approach opens the possibility for a variety of new applications that exploit the negative capacitance of ferroelectrics to cancel capacitance in integrated circuits. As an example, we show the P-NCFET structure has a significantly higher unity-current-gain frequency ${f}_{T}$ compared to a conventional MOSFET. [ABSTRACT FROM AUTHOR]

As continuous development and optimization of negative-capacitance field-effect transistors (NCFETs) are pursued for digital applications, it is also desirable to examine the radio frequency (RF) performance of these devices, especially devices with the metal–ferroelectric–insulator–semiconductor (MFIS) structure. In this article, we use a combination of physics-based modeling and small-signal circuits to investigate the RF performance of MFIS NCFETs using three key device figures of merit: the well-known unity-current-gain (cutoff) frequency ƒT and the well-known maximum oscillation frequency ƒmax, and another important metric specified by gmƒT/ID , where gm is the transconductance and ID is the dc drain current. We find that MFIS NCFETs achieve similar ƒTand ƒmax performance to conventional MOSFETs, but offer a significant advantage in gmƒT/ ID. [ABSTRACT FROM AUTHOR]

Ferroelectric and negative-capacitance field-effect transistors (FeFETs and NCFETs) have recently garnered great attention as devices for applications in memory and low-power logic, respectively. As these technologies are pursued, it is critical to have a variety of measurement approaches, including methods familiar to the electron-device and microwave communities that can aid in fully understanding the behavior of ferroelectrics in FeFETs and NCFETs. In this paper, we propose and show the viability of using frequency-domain electrical measurement techniques employing the well-known microwave S-parameters, and their large-signal generalization and X-parameters. Our methods provide the means to trace the intrinsic polarization versus electric-field curve of the ferroelectric, i.e., with the parasitics de-embedded, thereby showing the innate ferroelectric response, which cannot be done using conventional techniques. These methods also enable extraction of all the parameters of the Landau–Khalatnikov equation, which is commonly used to model ferroelectric behavior in FeFETs and NCFETs. This paper hence takes a useful step toward methods familiar to the electron-device community that can help to better understand and optimize FeFET and NCFET technologies. [ABSTRACT FROM AUTHOR]

We examine the impact of line-edge roughness (LER) on the variability in the on-current and saturation threshold voltage of ultrascaled FinFET devices via quantum-mechanical transport simulation. We obtain a realistic model of LER by decomposing the LER into short- $\lambda $ and long- $\lambda $ fluctuations, and we consider their separate influences on device performance. We show that the long- $\lambda $ fluctuations lead to greater device variability than the short- $\lambda $ fluctuations, and we explain the difference between the two cases via the influence of fluctuating quantum confinement arising from the LER. Finally, we consider devices in which the long- $\lambda $ fluctuations of the two fin edges are correlated and demonstrate that this correlation significantly improves the variability. Thus, we show the continued need for fabrication technology either to reduce the amplitude of the long- $\lambda $ fluctuations or to ensure the long- $\lambda $ fluctuations between the sidewalls of ultrascaled FinFET devices are correlated. [ABSTRACT FROM AUTHOR]

Recently, negative-capacitance FETs (NCFETs) have been proposed to reduce subthreshold slope and help continue supply-voltage scaling alongside channel-length scaling. We investigate the high-frequency switching behavior of NCFETs using the Landau–Khalatnikov equation to model ferroelectric materials. Multidomain interactions in the ferroelectric are considered, resulting in strong agreement with experimental measurements. Operation of NCFETs at gigahertz frequencies is investigated with this experimentally validated multidomain model. We find that the effectiveness of the voltage amplification in NCFETs is strongly dependent on the viscosity coefficient $\rho $ of the ferroelectric, and that a low \rho $ ( <0.1~\Omega \cdot \text {m} ) is required for the operation at the high gigahertz frequencies. [ABSTRACT FROM PUBLISHER]

As continuous development and optimization of negative-capacitance field-effect transistors (NCFETs) are pursued for digital applications, it is also desirable to examine the radio frequency (RF) performance of these devices, especially devices with the metal–ferroelectric–insulator–semiconductor (MFIS) structure. In this article, we use a combination of physics-based modeling and small-signal circuits to investigate the RF performance of MFIS NCFETs using three key device figures of merit: the well-known unity-current-gain (cutoff) frequency ƒT and the well-known maximum oscillation frequency ƒmax, and another important metric specified by gmƒT/ID , where gm is the transconductance and ID is the dc drain current. We find that MFIS NCFETs achieve similar ƒTand ƒmax performance to conventional MOSFETs, but offer a significant advantage in gmƒT/ ID. [ABSTRACT FROM AUTHOR]