1. Deep UV lithography process in generic InP integration for arrayed waveguide gratings
- Author
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Sylwester Latkowski, Kevin A. Williams, Huub Ambrosius, LM Luc Augustin, E. Bitincka, J. Darracq, Jeroen Bolk, Ripalta Stabile, D. Marsan, Xaveer Leijtens, NanoLab@TU/e, Electro-Optical Communication, Photonic Integration, Electrical Engineering, Low Latency Interconnect Networks, and Center for Quantum Materials and Technology Eindhoven
- Subjects
Materials science ,Lithography ,Physics::Optics ,Tapering ,02 engineering and technology ,01 natural sciences ,Waveguide (optics) ,law.invention ,010309 optics ,Arrayed Waveguide Grating ,law ,0103 physical sciences ,Electrical and Electronic Engineering ,photonic integrated circuit ,business.industry ,Photonic integrated circuit ,indium phosphide ,021001 nanoscience & nanotechnology ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Arrayed waveguide grating ,Optoelectronics ,Photolithography ,Photonics ,0210 nano-technology ,business ,Critical dimension - Abstract
Low-excess-loss arrayed waveguide gratings are enabled by unique application of deep UV lithography in InP integrated photonics through reduced feature sizes and, more specifically, well-resolved inter-waveguide gap dimensions. Submicrometer wafer-flatness is shown to be required to achieve the critical dimension uniformity better than 10 nm on 3-in substrates. Arrayed waveguide grating devices were fabricated and the effect of inter-waveguide gap scaling on the excess losses was measured and compared to simulations. Excess losses down to 0.15 dB were demonstrated to be lower than predicted with the 2-D simulations. The tapering of the etch depth inside the gaps due to the lag effect of the etch process may explain the improvements.
- Published
- 2018