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Magnetic fields generated by current lines are the standard way of switching between resistance (R) states in magnetic random access memories. A less common but technologically more interesting alternative to achieve R-switching is to use an electrical current crossing the tunnel barrier. Such current induced magnetization switching (CIMS) or current induced switching (CIS) effects were recently observed in thin magnetic tunnel junctions, and attributed to spin transfer (CIMS) or electromigration of atoms into the insulator (CIS). In this work, electromigration-driven resistance changes (resistive switching) are superimposed with thermally induced pinned layer reversal (magnetic switching), producing a reproducible, three-state memory device. The tunnel junctions under study show a tunnel magnetoresistance of 14% with a RA product of 50 O µm2. The reversible electromigration-driven resistance changes amount to 7-8% of the full resistance change and more than 104 R-switching events can be current induced without significant damage to the tunnel junction. Typical critical current densities are of the order of 2 × 106 A cm[?]2. [ABSTRACT FROM AUTHOR]

A novel work on several aspects of current conduction mechanism for resistive switching (RS) of a reactive electrode-based memristor (Al/ZnO/Al) against generally used inert electrode–based devices has been illustrated. Compliance current (Icc), i.e. maximum current through device and stop voltage (Vstop), i.e. maximum Vstop upon device, has been used as bias characteristics to evaluate the effect upon conduction behavior. Effect of change in Icc for constant Vstop and vice-versa upon high resistance state (HRS) and low resistance state (LRS) has been evaluated in terms of change in bulk defects, i.e. oxygen vacancy and interface inhomogenity, i.e. AlOx formation/dissolution. The device shows unipolar resistive switching (URS) at lower Icc (< = 0.1 mA) and transits irreversibly into bipolar resistive switching (BRS) at higher Icc (> = 1 mA). The dominant conduction behavior of the device is found to be homogenous resistive switching (HoRS). The conduction in HRS and LRS is found to be space-charge limited current conduction. Conductive atomic force microscopy results of the thin film switching layer support the HoRS mechanism and also illustrate the role of interfacial oxide in attributing BRS behavior in the Al/ZnO/Al resistive switch. Studies can be utilized in future to further understand the RS conduction mechanism in reactive electrode–based RS and can be applied for multi-state memory applications. [ABSTRACT FROM AUTHOR]

A three-terminal device based on electronic phase separated manganites is suggested to produce high performance resistive switching. Our Monte Carlo simulations reveal that the conductive filaments can be formed/annihilated by reshaping the ferromagnetic metal phase domains with two cross-oriented switching voltages. Besides, by controlling the high resistance state (HRS) to a stable state that just after the filament is ruptured, the resistive switching remains stable and reversible, while the switching voltage and the switching time can be greatly reduced. [ABSTRACT FROM AUTHOR]

Resistance change random access memory (RRAM) cells, typically built as MIM capacitor structures, consist of insulating layers I sandwiched between metal layers M, where the insulator performs the resistance switching operation. These devices can be electrically switched between two or more stable resistance states at a speed of nanoseconds, with long retention times, high switching endurance, low read voltage, and large switching windows. They are attractive candidates for next-generation non-volatile memory, particularly as a flash successor, as the material properties can be scaled to the nanometer regime. Several resistance switching models have been suggested so far for transition metal oxide based devices, such as charge trapping, conductive filament formation, Schottky barrier modulation, and electrochemical migration of point defects. The underlying fundamental principles of the switching mechanism still lack a detailed understanding, i.e. how to control and modulate the electrical characteristics of devices incorporating defects and impurities, such as oxygen vacancies, metal interstitials, hydrogen, and other metallic atoms acting as dopants. In this paper, state of the art ab initio theoretical methods are employed to understand the effects that filamentary types of stable oxygen vacancy configurations in TiO2 and NiO have on the electronic conduction. It is shown that strong electronic interactions between metal ions adjacent to oxygen vacancy sites results in the formation of a conductive path and thus can explain the 'ON' site conduction in these materials. Implication of hydrogen doping on electroforming is discussed for Pr0.7Ca0.3MnO3 devices based on electrical characterization and FTIR measurements. [ABSTRACT FROM AUTHOR]

NiO films display unipolar resistance switching characteristics, due to the electrically induced formation and rupture of nanofilaments. While the applicative interest for possible use in highly dense resistance switching memory (RRAM) is extremely high, switching phenomena pose strong fundamental challenges in understanding the physical mechanisms and models. This work addresses the set and reset mechanisms for the formation and rupture of nanofilaments in NiO RRAM devices. Reset is described in terms of thermally-accelerated diffusion and oxidation processes, and its resistance dependence is explained by size-dependent Joule heating and oxidation. The filament is described as a region with locally-enhanced doping, resulting in an insulator-metal transition driven by structural and chemical defects. The set mechanism is explained by a threshold switching effect, triggering chemical reduction and a consequent local increase of metallic doping. The possible use of the observed resistance-dependent reset and set parameters to improve the memory array operation and variability is finally discussed. [ABSTRACT FROM AUTHOR]

Voltage-current (I-V) measurements in a wide temperature range from 88 to 573 K demonstrated the effects of temperature on the switching behavior of a Cu/Ta2O5/Pt resistive memory cell that is referred to as a gapless-type atomic switch. After the forming process, the cells were SET from the OFF state to the ON state at a positive bias to the Cu electrode and then RESET from the ON state to the OFF state at a negative bias. In a previous study (Tsuruoka et al 2010 Nanotechnology 21 425205), it was demonstrated that the SET process corresponds to the reformation of a metal filament between the electrodes by the inhomogeneous nucleation and subsequent growth of Cu whereas the RESET process can be attributed to the Joule-heating-assisted dissolution of the metal filament. In the work described here, we observed that the voltages at which the cells are SET and RESET (SET and RESET voltages) decreased in magnitude with an increase in temperature. From calculations of the nucleation rate of Cu nuclei based on the classical nucleation theory, it was found that the observed temperature variation of the SET voltage is primarily determined by supersaturation in the vicinity of the Pt electrode, which is controlled by the application of positive bias. The supersaturation required for spontaneous growth of a Cu nucleus decreases with increasing temperature, resulting in lower SET voltages at higher temperatures. The RESET voltage is determined by the thermal stability of the metal filament formed. Moreover, using the temperature variation in cell resistances of the ON state, the growth speed of the Cu nucleus after the nucleation was found to decease with increasing temperature. These results are consistent with our switching model. [ABSTRACT FROM AUTHOR]

The detailed mechanism of electronic bipolar resistance switching (BRS) in the Pt/TiO2/Pt structure was examined. The conduction mechanism analysis showed that the trap-free and trap-mediated space-charge-limited conduction (SCLC) governs the low and high resistance state of BRS, respectively. The SCLC was confirmed by fitting the current-voltage characteristics of low and high resistance states at various temperatures. The BRS behavior originated from the asymmetric potential barrier for electrons escaping from, and trapping into, the trap sites with respect to the bias polarity. This asymmetric potential barrier was formed at the interface between the trap layer and trap-free layer. The detailed parameters such as trap density, and trap layer and trap-free layer thicknesses in the electronic BRS were evaluated. This showed that the degradation in the switching performance could be understood from the decrease and modified distribution of the trap densities in the trap layer. [ABSTRACT FROM AUTHOR]

We report the observation of two resistance switching modes in certain 50 nm x 50 nm crossbar TiO2 memristive devices that have been electroformed with a low-current process. The two switching modes showed opposite switching polarities. The intermediate state was shared by both modes (the ON state of the high-resistance mode or the OFF state of the low-resistance mode) and exhibited a relaxation to a more resistive state, including an initial transient decay. The activation energies of such a decay and ON-switching to the intermediate state were determined to be 50-210 meV and 1.1 eV, respectively. Although they are attributed to the coexistence of charge trapping and ionic motion, the ionic motion dominates in both switching modes. Our results indicate that the two switching modes in our system correspond to different switching layers adjacent to the interfaces at the top and bottom electrodes. [ABSTRACT FROM AUTHOR]

We propose diamond-like carbon (DLC) as the resistance change material for nonvolatile memory applications. Nanoscale DLC films are prepared by filtered cathodic vacuum arc technique and integrated to W/DLC/W structure devices. The deposited DLC film has a thickness of about 20 nm and high sp3 fraction content. Reversible bistable resistive switching from a high resistance state to a low resistance state, and vice versa, is observed under appropriate unipolar stimulation pulses. High resistance switching ratio (larger than a thousand times) and low level of switching power (about 11 mW) are demonstrated. We propose that the mechanism of the repetitive resistive switching is the growth and breakage of conductive sp2-like filaments in the predominantly sp3-type insulating carbon upon applications of voltage pulses, which is consistent with the experimental results. [ABSTRACT FROM AUTHOR]

This paper describes the resistive switching of a cross-point cell array device, with a junction area of 100 nm x 100 nm, fabricated using ultraviolet nanoimprinting. A GdOx and Cu-doped MoOx stack with platinum top and bottom electrodes served as the resistive switching layer, which shows analog memory characteristics with a resistance ratio greater than 10. To demonstrate a neural network circuit, we operated the cell array device as an electrically modifiable synapse array circuit and carried out a weighted sum operation. This demonstration of cross-point arrays, based on resistive switching memory, opens the way for feasible ultra-high density synapse circuits for future large-scale neural network systems. [ABSTRACT FROM AUTHOR]

Resistance switching phenomena in an amorphous Ni-Ti-O film were investigated. Very clear bipolar resistive switching characteristics were observed with good reproducibility. Stable retention and on/off pulse switching operation was demonstrated. An analysis of x-ray photoelectron spectroscopy of the Ni-Ti-O film provided a clue that the observed unusual bipolar resistance switching in the film is due to a microscopic change in the Ni-O and Ti-O binding states at the Ni-Ti-O film/electrode interface. [ABSTRACT FROM AUTHOR]

Current-voltage (I-V) characteristics are investigated in a low-initial-resistance Ag/Pr0.7Ca0.3MnO3/Pt sandwich structure. It is found that the junction can show stable low and high resistance states in ±0.3 V voltage sweeping cycles. The set and reset voltage values are, respectively, +0.1 V and [?]0.2 V, which are very low as compared with those reported previously. Furthermore, the I-V curves in both resistance states exhibit rather linear behaviour, without any signature of metal/insulator interface effects. This implies that the Schottky interface mechanism might not be an indispensable factor for the colossal electroresistance effect. The origin of low switching voltages is attributed to the reduced effective distance for electric field action due to the sufficient oxygen content of the PCMO layer. The underlying physics is discussed in terms of the filament network model together with the field-induced oxygen vacancy motion model. [ABSTRACT FROM AUTHOR]