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The corresponding description of this figure should be "As shown in Fig.2, the full width at half maximum (FWHM) of the Tl-1223(006) reflection peak is only 0.58 , which shows that the film possesses a good crystalline structure", instead of "As shown in Fig.2, the FWHM of the Tl-1223(003) reflection peak is only 0.58 , which shows that the film possesses a good crystalline structure". 36(2019)057401] Jian Xing( ) 1, Li-Tian Wang( ) 1, Xiao-Xin Gao( ) 1, Xue-Lian Liang( ) 1, Kai-Yong He( ) 1, Ting Xue( ) 1, Sheng-Hui Zhao( ) 1, Jin-Li Zhang( ) 1, Ming He( ) 1,2, Xin-Jie Zhao( ) 1,3, Shao-Lin Yan( ) 1, Pei Wang( ) 4, and Lu Ji( ) 1,3* 1 College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300350, China 2 Tianjin Key Laboratory of Optoelectronic Sensor and Sensing Network Technology, Tianjin 300350, China 3 Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, Tianjin 300350, China 4 Beijing Institute of Radio Measurement, Beijing 100854, China (Received 26 October 2020; accepted 18 December 2020; published online 27 January 2021) DOI: 10.1088/0256-307X/38/2/029901 1 4 1 6 1 8 2 0 0. 0 1. 5 3. 0 4. 5 6. 0 I n t e n s i t y (1 0 4 c p s) w (d e g) F W H M = 0. 5 8 O Fig. In Fig.2 of the article, [1] the figure caption should be"Rockingcurveofthe(006)peakoftheTl-1223thin film" instead of "Rocking curve of the (003) peak of the Tl-1223 thin film". [Extracted from the article]

TlBa2Ca2Cu3O9 (Tl-1223) films have promising applications due to their high critical temperature and strong magnetic flux pinning. Nevertheless, the preparation of pure phase Tl-1223 film is still a challenge. We successfully fabricate Tl-1223 thin films on LaAlO3 (001) substrates using dc magnetic sputtering and a post annealing two-step method in argon atmosphere. The crystallization temperature of Tl-1223 films in argon is reduced by 100°C compared to that in oxygen. This greatly reduces the volatilization of Tl and improves the surface morphology of films. The lower annealing temperature can effectively improve the repeatability of the Tl-1223 film preparation. In addition, pure Tl-1223 phase can be obtained in a broad temperature zone, from 790°C to 830°C. In our study, the films show homogenous and dense surface morphology using the presented method. The best critical temperature of Tl-1223 films is characterized to be 110 K, and the critical current Jc (77 K, 0 T) is up to 2.13 × 106 A/cm2. [ABSTRACT FROM AUTHOR]