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Manganese dioxide is one of the key materials in battery, adsorption media, and catalytic materials in the environmental field because of its excellent properties. In this investigation, new synthetical technology—the microwave discharge plasma in liquid method was used directly to make manganese dioxide with potassium permanganate (KMnO4) solution. The synthesis was realized in one step by the microwave discharging plasma in potassium permanganate aqueous solution without using any dispersants or stabilizers. The reduction time was very short, it only takes 3 min to complete the reduction of the 0.2 mmol l−1 potassium permanganate solution for the formation of MnO2. The structure characteristics and adsorption-desorption curves were studied by X-ray diffractometer (XRD), transmission electron microscopy and x-ray photoelectron spectroscopy, XRD, etc. it was found that the synthesized manganese dioxide nano-sheet had a layered structure and a large specific surface area (248.89 m2 g−1). The methylene blue was used to validate the effectiveness of the prepared manganese dioxide. The results showed that the synthesized manganese dioxide had good adsorption and photocatalytic properties. In conclusion, the microwave liquid-phase discharge plasma is a very effective reduction method with potential development. [ABSTRACT FROM AUTHOR]

In the past three decades, first principles-based fully kinetic particle-in-cell Monte Carlo collision (PIC/MCC) simulations have been proven to be an important tool for the understanding of the physics of low pressure capacitive discharges. However, there is a long-standing issue that the plasma density determined by PIC/MCC simulations shows quantitative deviations from experimental measurements, even in argon discharges, indicating that certain physics may be missing in previous modeling of the low pressure radio frequency (rf) driven capacitive discharges. In this work, we report that the energetic electron-induced secondary electron emission (SEE) and excited state atoms play an important role in low pressure rf capacitive argon plasma discharges. The ion-induced secondary electrons are accelerated by the high sheath field to strike the opposite electrode and produce a considerable number of secondary electrons that lead to additional ionizing impacts and further increase of the plasma density. Importantly, the presence of excited state species even further enhances the plasma density via excited state neutral and resonant state photon-induced SEE on the electrode surface. The PIC/MCC simulation results show good agreement with the recent experimental measurements in the low pressure range (1–10 Pa) that is commonly used for etching in the semiconductor industry. At the highest pressure (20 Pa) and driving voltage amplitudes 250 and 350 V explored here, the plasma densities from PIC/MCC simulations considering excited state neutrals and resonant photon-induced SEE are quantitatively higher than observed in the experiments, requiring further investigation on high pressure discharges. [ABSTRACT FROM AUTHOR]

We present measurements of the time evolution of plasma and electrical parameters in a pulsed capacitively coupled argon discharge operated at a radio frequency of 12.5 MHz, whose amplitude is ‘step-up’ and ‘step-down’ modulated. The ‘step-up (-down)’ amplitude-modulated waveform consists of three segments, i.e., a low (high)-voltage, a high (low)-voltage, and a zero-voltage stage. Here, we focus on the effect of the ratio (ζ = V L/ V H ⩽ 1) of the low-(V L) to high-voltage (V H) amplitude (measured at the end of the respective segment) on the time evolution of discharge parameters. We monitor the behavior of the discharge by measuring (i) the optical emission intensity (OEI) of a selected Ar-I spectral line, (ii) the electron density at the center of the plasma (using a hairpin probe) as well as (iii) the electrical characteristics (by voltage and current probes). It is found that at relatively large ζ (i.e., at low disparity between the two voltage amplitudes), for both the ‘step-up’ and ‘step-down’ cases, these parameters evolve relatively smoothly with time upon changing the voltage amplitude, and the ignition process strongly depends on the duration of the zero-voltage period. At low ζ (i.e., at high disparity between the voltage amplitudes), an abnormal evolution of the parameters can be observed during the low-voltage period for both cases. Specifically, the voltage amplitude and the modulus of the system impedance increase to a higher value, while the relative phase, φ vi, between the voltage and the current approaches 90°, resulting in a reduction of the power deposition and the OEI. The enhanced voltage amplitude decreases to a steady-state value, accompanied by a decline of φ vi, and an abnormal increase of the current amplitude and the electron density after some time, of which the duration increases with the decrease of ζ. The ζ -dependent evolution of the electron density during the low-voltage period was found to significantly affect the subsequent ignition process and electron power absorption mode at the beginning of the high-voltage period. [ABSTRACT FROM AUTHOR]

This article is devoted to the study of the glow intensity of radio-frequency capacitive discharge plasma with nanoparticles for further use in lighting devices. The process of carbon nanoparticles synthesis in the radiofrequency discharge was investigated, and the influence of plasma parameters on the formation and growth of the material was also studied. A method for determining the diameter of nanoparticles based on self-bias voltage and electron density is considered. It is revealed that the diameter of nanoparticles has a considerable influence on the optical properties of the plasma, in particular, on the emission intensity. Based on the obtained data, laboratory samples of lighting devices with improved luminous intensities were developed. [ABSTRACT FROM AUTHOR]

The fluid model, also called the macroscopic model, is commonly used to simulate low temperature and low pressure radiofrequency plasma discharges. By varying the parameters of the model, numerical simulation allows us to study several cases, providing us the physico-chemical information that is often difficult to obtain experimentally. In this work, using the fluid model, we employ numerical simulation to show the effect of pressure and space between the reactor electrodes on the fundamental properties of silicon plasma diluted with ammonia and hydrogen. The results show the evolution of the fundamental characteristics of the plasma discharge as a function of the variation of the pressure and the distance between the electrodes. By examining the pressure-distance product in a range between 0.3 Torr 2.7 cm and 0.7 Torr 4 cm, we have determined the optimal pressure-distance product that allows better deposition of hydrogenated silicon nitride (SiNxHy) films which is 0.7 Torr 2.7 cm. [ABSTRACT FROM AUTHOR]

The influence of solid particles produced in plasma of microwave discharge in liquid n-heptane at atmospheric pressure on the electron energy distribution functionand detailed analysis of ion composition of plasma are presented. [ABSTRACT FROM AUTHOR]

The vibrational kinetics model of the dissociation process CO2 + M → CO + O + M based on the two-modes (symmetric–asymmetric) approximation is presented. The model has shown to produce the effective dissociation rate of CO2 under conditions of thermal equilibrium close to that obtained experimentally. Results of the 0D calculations of the CO2 conversion in non-equilibrium conditions of a microwave plasma discharge are discussed. The chemical energy efficiency obtained in the calculations at translational-rotational temperature 300 K and degree of ionization 10−5 is between 42 and 56% depending on the assumptions. The efficiency is found to reduce and eventually vanish at elevated temperatures. [ABSTRACT FROM AUTHOR]

This paper is the first from a set of two companion papers on radio-frequency (RF) discharges. These two papers are in turn part of a larger series on the foundations of plasma and discharge physics. In this part we cover the basics of non-magnetized capacitive and inductive RF discharges, introduce the main concepts related to them and provide reference literature for further reading. In the second part we concentrate on RF discharges in the presence of external magnetic field. These types of RF discharges find a wide range of applications in various industries. Among the most prominent examples are the microelectronics industry for etching and deposition of thin films, the medical and food industry for the application of various coatings and changing the wettability of surfaces, the space industry to power ion-gridded thrusters for satellites, the fusion and elementary particle research for the production of beams of energetic ions or atoms. The paper introduces the basic concepts of RF power deposition and describes in more detail the operating conditions of the plasma reactors. The most important physical phenomena encountered in these discharges are outlined through the use of simplified models. The paper is intended as an entry point for newcomers to the field and provides ample of references (including textbooks) for further reading on the more specific and/or subtle aspects of the operation of these types of RF discharges. [ABSTRACT FROM AUTHOR]

The mixing of N2 with H2 leads to very different plasmas from pure N2 and H2 plasma discharges. Numerous issues are therefore raised involving the processes leading to ammonia (NH3) formation. The aim of this work is to better characterize capacitively-coupled radiofrequency plasma discharges in N2 with few percents of H2 (up to 5%), at low pressure (0.3–1 mbar) and low coupled power (3–13 W). Both experimental measurements and numerical simulations are performed. For clarity, we separated the results in two complementary parts. The actual one (first part), presents the details on the experimental measurements, while the second focuses on the simulation, a hybrid model combining a 2D fluid module and a 0D kinetic module. Electron density is measured by a resonant cavity method. It varies from 0.4 to 5 × 109 cm−3, corresponding to ionization degrees from 2 × 10−8 to 4 × 10−7. Ammonia density is quantified by combining IR absorption and mass spectrometry. It increases linearly with the amount of H2 (up to 3 × 1013 cm−3 at 5% H2). On the contrary, it is constant with pressure, which suggests the dominance of surface processes on the formation of ammonia. Positive ions are measured by mass spectrometry. Nitrogen-bearing ions are hydrogenated by the injection of H2, N2H+ being the major ion as soon as the amount of H2 is >1%. The increase of pressure leads to an increase of secondary ions formed by ion/radical–neutral collisions (ex: N2H+, NH4+, H3+), while an increase of the coupled power favours ions formed by direct ionization (ex: N2+, NH3+, H2+). [ABSTRACT FROM AUTHOR]

Particle-in-cell/Monte Carlo collision simulations are performed to investigate the effects of using realistic models for secondary electron emission induced by different plasma species on the discharge characteristics in direct current (DC) superposed radio-frequency (RF) capacitively coupled plasmas (CCPs). A dual-frequency (DF, 60/2 MHz) source is applied on one of the electrodes to sustain the discharge, and an auxiliary DC source is fixed on the opposite electrode to generate energetic secondary electrons (SEs). Realistic models are employed to calculate the secondary electron yields (SEYs) induced by electrons and heavy particles (i.e. ions and fast neutrals) impacting the 'dirty' surfaces (e.g. oxidized metal), respectively, in argon discharge at a fixed pressure of 1.5 Pa. The results are compared to those obtained by assuming a constant ion-induced SEYs of γ = 0.1, and a constant elastic reflected electron yield of ηel. = 0.2. As the effective SEY γ* (arising from heavy particle impact) calculated from the realistic model is enhanced at the DC electrode, numerous γ-electrons can be induced under the effect of the DC-bias. These γ-electrons then bombard the opposite RF electrode with mean energies corresponding to the value of DC-bias, which further induce significant emission of δ-electrons (i.e. electron-induced SEs). Moreover, the δ-electrons originating from the RF electrode can be trapped and bounced back by the opposite DC sheath toward the RF electrode, inducing δ-electron emission once more. Consequently, this positive-feedback source of δ-electrons, leads to an enhanced ionization in the first half-cycle of the low frequency period, and a further growth in plasma density in hybrid DC/RF discharge. [ABSTRACT FROM AUTHOR]

An atmospheric pressure surface-wave microwave discharge and a kHz plasma jet are used to activate purified water. It is shown, that by varying the treatment distance and the initial Ar/N2/O2 mixture composition of the surface-wave microwave discharge the concentration ratio of NO3− and H2O2 radicals created in the plasma activated water (PAW) can be varied over three orders of magnitude, which can be preserved during months of storage at room temperature. At the same time, with the 5 min treatment of the 32 ml water the absolute radical concentrations are varied in the range of 0.5–85 mg l−1 for H2O2, 20–180 mg l−1 for NO3− and 0.5–14 mg l−1 for NO2−. In the case of the N2 kHz plasma jet this concentration ratio can be tuned within one order of magnitude by varying the treatment distance. By treating different volumes very similar concentration ratios are obtained, which evolve differently during storage, as the ageing dynamics is determined by the absolute concentration of radicals. In general, the radical most affected by ageing is NO2−, whose recombination is found to be determined by the H2O2 radical. In order to control the H2O2 concentration and thus the NO2− radicals recombination, the application of a Fenton type reaction is suggested, which is implied by inserting a copper surface into PAW during or after plasma treatment. [ABSTRACT FROM AUTHOR]

In many cases, the capacitance of a plasma discharge is determined by the sheath capacitance, and therefore controlling the sheath thickness can result in a novel plasma-tunable capacitor. In this work, experiments were conducted with capacitively-coupled RF discharge in the alpha regime using parallel-plate electrode geometry in air at 1 Torr with an RF amplifier operating at a constant voltage in a wide range of frequencies, 20–120 MHz. The impedance characteristics and the sheath and plasma parameters were inferred from the current and voltage measurements supplemented with optical imaging. The experimental data show that the sheath thickness is approximately inversely proportional to the excitation RF frequency, so that the capacitance is proportional to the frequency, in agreement with a simple theory. In applications, tuning the sheath thickness by varying the excitation RF frequency could be used to control the impedance variation in a different range of probing RF frequencies, including control of the transition from capacitive to inductive behaviour. [ABSTRACT FROM AUTHOR]