1. Laser doping mechanism of 4H-SiC by KrF excimer laser irradiation using SiNx thin films
- Author
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Takuma Yasunami, Daisuke Nakamura, Keita Katayama, Yoshiaki Kakimoto, Toshifumi Kikuchi, and Hiroshi Ikenoue
- Subjects
General Engineering ,General Physics and Astronomy - Abstract
In this study, nitrogen is doped into 4H-SiC by irradiating 4H-SiC with a SiNx thin film and a KrF excimer laser. The doping depth profile, crystal structure, electrical properties, and surface roughness results are analyzed to evaluate the excimer-laser doping mechanism. High-concentration doping is possible at a fluence of 2.5 J cm−2 and 10 shots, while maintaining the 4H-SiC crystal structure via solid-phase diffusion. However, changes in the 4H-SiC crystalline state are observed upon liquid-phase diffusion at a fluence of ≥2.8 J cm−2. At a fluence of 2.5 J cm−2 and 100 shots, nitrogen can be deeply diffused via solid-phase diffusion; however, an amorphous layer is formed on the surface and there is an increase in contact resistance.
- Published
- 2023
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