15 results on '"Endo, Katsuyoshi"'
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2. Open-air-type Ar + H2O plasma treatment of polytetrafluoroethylene for improving Ag/PTFE adhesion strength: application to highly adhesive Ag direct wiring patterns.
3. Enhancements of photoluminescence intensity in high-quality floating-zone Si by thermal annealing in vacuum
4. Open-air type plasma chemical vaporization machining by applying pulse-width modulation control
5. Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments
6. Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations
7. Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
8. High-Spatial-Resolution Machining Utilizing Atmospheric Pressure Plasma: Machining Characteristics of Silicon
9. First-Principles Calculation of Tunneling Current of H2- or NH3-Adsorbed Si(001) Surface in Scanning Tunneling Microscopy
10. Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
11. Visible Light Irradiation Effects on STM Observations of Hydrogenated Amorphous Silicon Surfaces
12. Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
13. Theoretical Study on the Scanning Tunneling Microscopy Image of Cl-Adsorbed Si(001)
14. Atomic Structure of Si(001)-c(4×4) Formed by Heating Processes after Wet Cleaning and Its First-Principles Study
15. Growth of Crystalline Silicon on a Cryogenic Substrate by Photochemical Reaction in a Condensed Phase
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