1. Second-Order Optical Nonlinearity Induced in Thermally Poled PbO–SiO2Mixed Film on Fused Silica
- Author
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Hung-Yi Lin and Huai-Yi Chen
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,business.industry ,General Engineering ,General Physics and Astronomy ,Substrate (electronics) ,Waveguide (optics) ,Wavelength ,Transverse plane ,Optics ,Planar ,Sputtering ,Refractive index contrast ,Composite material ,business ,Lead oxide - Abstract
We developed a lead oxide PbO film of ~170 nm thickness by RF sputtering on a fused silica substrate. When this film sample is annealed in an oven at 650 °C for 4 min, its physical thickness measured using a surface profiler decreases to ~163 nm, but its optical film thickness determined using a spectrophotometer increases to 382 nm. This fact implies that PbO will diffuse into the fused silica substrate and form a PbO–SiO2 mixed film that is a graded-index planar waveguide with two transverse electric (TE) modes at 633 nm wavelength. Although the Maker fringe patterns of both fused silica and PbO–SiO2 mixed film samples thermally poled at 6 kV, 275 °C and 30 min look similar, we speculate that second-order nonlinearity exists in poled PbO–SiO2 mixed film because of the higher refractive index contrast at the air-to-film interface. A nonlinear optical coefficient of approximately 1 pm/V in poled PbO–SiO2 mixed film is calculated using a double-step nonlinear profile and grid search fitting technique. The induced second-order nonlinearity is stable for at least several months.
- Published
- 2008
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