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In 0.3Ga 0.7N metal–insulator–semiconductor (MIS) and metal–semiconductor (MS) surface barrier photodetectors have been fabricated. The In0.3Ga0.7N epilayers were grown on sapphire by metalorganic chemical vapour deposition (MOCVD). The photoresponse and reverse current–voltage characteristics of the In0.3Ga0.7N MIS and MS photodetectors were measured. A best zero bias responsivity of 0.18 A/W at 450 nm is obtained for the In0.3Ga0.7N MIS photodetector with 10 nm Si3N4 insulator layer, which is more than ten times higher than the In0.3Ga0.7N MS pho-todetector. The reason is attributed to the decrease of the interface states and increase of surface barrier height by the inserted insulator. The influence of the thickness of the Si3N4 insulator layer on the photoresponsivity of the MIS photodetector is also discussed.

Thirty-pair Al0.3Ga0.7N/AlN distributed Bragg reflectors centred at 320 nm are designed and grown on sapphire substrates by metalorganic chemical vapour deposition. No cracks are observed in the main area of the 2-inch wafer except for about 4 mm margin under an optical microscope. Regular stack of alternating layers is shown by scanning electron microscopy. Clear two-dimensional growth steps and very low surface roughness are shown by atomic force microscopy (AFM). Well-defined periodicity is shown by high resolution x-ray diffraction. High reflectivity of 93% at 313 nm with a bandwidth of 13 nm is obtained.

The energy band diagram and charge distribution of the unintentional doped AlGaN/GaN/AlGaN/GaN double heterostructure were obtained by self-consistent Poisson–Schrodinger calculations. The severe band tilting and high two-dimensional electron gas (2DEG) density mainly attribute to the large internal polarization intensity, which is close to a linear function of Al composition. The influence of Al composition is investigated. The results show that band tilting enlarges and 2DEG gains with Al composition, and two-dimensional hole gas occurs when Al composition reaches a certain extent. The influence of Al composition and two-dimensional hole gas (2DHG) on devices is discussed.

The unintentionally doped samples of Al0.22Ga0.78N/GaN/Al0.22Ga0.78N/GaN multi-heterostructures have been designed and fabricated. The polarization induced charge and free-carrier charge distributions have been demonstrated and the energy band profile has also been calculated. The results indicate the existence of two-dimensional electron gas (2DEG) and hole well at the heterointerfaces. By means of variable temperature Hall measurements, the carrier mobility and the sheet carrier density were measured from 300 to 77 K. The significant increment of carrier mobility at low temperature also verified the existence of the 2DEG.

The advantages of the p-AlInGaN/GaN superlattices' (SLs) structure as an electron blocking layer (EBL) for InGaN blue light-emitting diodes (LEDs) were studied by experiment and APSYS simulation. Electroluminescence (EL) measurement results show that the LEDs with the p-AlInGaN/GaN SLs' structure EBL exhibited better optical performance compared with the conventional AlGaN EBL due to the enhancement of hole concentration and hole carrier transport efficiency, and the confinement of electrons' overflow between multiple quantum-wells (MQWs) and EBL.