25 results on '"Kono, Akihiro"'
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2. Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3into N2Downflow Plasma
3. Quantum Chemical Investigation for Chemical Dry Etching of SiO2by Flowing NF3into H2Downflow Plasma
4. Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma
5. Measurement of Negative Ions Generated on the Si Etched Surface
6. Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma
7. Dissociation Channels of c-C4F8to CF2Radical in Reactive Plasma
8. Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet
9. Heat Transport Simulation for Atmospheric-Pressure High-Density Microgap Plasma
10. High-Spatial-Resolution Multichannel Thomson Scattering Measurements for Atmospheric Pressure Microdischarge
11. Structure of collisional and collisionless sheaths: closed expressions for sheath thickness
12. Intrinsic sheath edge conditions for sheath instability in low-pressure electronegative plasmas
13. Complex sheath formation around a spherical electrode in electronegative plasmas: a comparison between a fluid model and a particle simulation
14. Production of CW High-Density Non-Equilibrium Plasma in the Atmosphere Using Microgap Discharge Excited by Microwave
15. Photodetachment Study of Capacitively-Coupled RF C4F8 Plasma
16. Spatial Distribution Measurement of Absolute Densities of CF and CF 2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
17. Formation of an oscillatory potential structure at the plasma boundary in electronegative plasmas
18. Translational Temperature Measurement for SiH2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy
19. Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
20. Behavior of Electrons and Negative Ions in a Capacitively-Coupled Radio-Frequency NF 3/Ar Plasma
21. Dilution-Gas Effect on Electron Density and Temperature in RF SiH 4 Plasma Based on Microwave Cavity Resonance Measurement
22. Laser-Induced-Fluorescence Study of the SiH2 Density in RF SiH4 Plasmas with Xe, Ar, He, and H2 Dilution Gases
23. Effect of Dilution Gases on the SiH3Radical Density in an RF SiH4Plasma
24. Laser-Induced-Fluorescence Detection of SiH2 Radicals in a Radio-Frequency Silane Plasma
25. Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma.
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