1. Wafer-scale graphene-ferroelectric HfO2/Ge–HfO2/HfO2 transistors acting as three-terminal memristors
- Author
-
C. Palade, Valentin S. Teodorescu, Mircea Dragoman, Magdalena Lidia Ciurea, Antoniu Moldovan, Daniela Dragoman, Maria Dinescu, and Adrian Dinescu
- Subjects
Materials science ,Band gap ,Bioengineering ,02 engineering and technology ,Memristor ,010402 general chemistry ,01 natural sciences ,law.invention ,law ,General Materials Science ,Wafer ,Electrical and Electronic Engineering ,business.industry ,Graphene ,Mechanical Engineering ,Transistor ,General Chemistry ,021001 nanoscience & nanotechnology ,Ferroelectricity ,0104 chemical sciences ,Terminal (electronics) ,Neuromorphic engineering ,Mechanics of Materials ,Optoelectronics ,0210 nano-technology ,business - Abstract
In this paper we report a set of experiments at the wafer level regarding field-effect transistors with a graphene monolayer channel transferred on the ferroelectric HfO2/Ge-HfO2/HfO2 three-layer structure. This kind of transistor has a switching ratio of 103 between on and off states due to the bandgap in graphene induced by the ferroelectric structure. Both top and back gates effectively control the carriers' charge flow in graphene. The transistor acts as a three-terminal memristor, termed a memtransistor, with applications in neuromorphic computation.
- Published
- 2020