38 results on '"Nakamura, Keiji"'
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2. Probe temperature effect on the curling probe and its correction technique
3. Evaluation of isocyanate functionalization ratio on multi-walled carbon nanotubes during N2/CO2 plasma treatment.
4. Experimental validity of double-curling probe method in film-depositing plasma
5. A novel technique for in-situ simultaneous measurement of thickness of deposited film and electron density with two curling probes
6. Low-temperature effect on GaN film in argon plasma
7. Recent innovations in microwave probes for reactive plasma diagnostics
8. Cause of wear-resistance enhancement of a polyurethane film composite by plasma-functionalized carbon nanotubes
9. Real-time curling probe monitoring of dielectric layer deposited on plasma chamber wall
10. Generation of slowly rotating microwave plasma by amplitude-modulated resonant cavity
11. A simple and straightforward expression for curling probe electron density diagnosis in reactive plasmas
12. Microwave plasma generation by the fast rotation and slow pulsation of resonant fields in a cylindrical cavity
13. Improvement on wear resistance property of polyurethane film by compositing plasma-treated multi-walled carbon nanotubes
14. Time-resolved curling-probe measurements of electron density in high frequency pulsed DC discharges
15. Optical and electrical investigation of Ar+-irradiated GaN
16. Opto-Curling Probe for Simultaneous Monitoring of Optical Emission and Electron Density in Reactive Plasmas
17. Temperature Dependence of Coercivity Behavior in Fe Films on Fractal Rough Ceramics Surfaces
18. In situProbe of GaN Film Surfaces under Plasma Conditions by Photoluminescence Technique
19. Electron Density Range Measurable by Microwave Resonator Probe with Higher Mode Resonance
20. Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas
21. Growth of Single-Crystalline Nanorods in Atmospheric Plasma
22. Observation of Optical Fluorescence of GaN Thin Films in an Inductively-Coupled Plasma Containing High Energy Electrons
23. Deposition of Tungsten Carbide Thin Films by Simultaneous RF Sputtering
24. Small-Signal and Noise Model of Fully Depleted Silicon-on-Insulator Metal–Oxide–Semiconductor Devices for Low-Noise Amplifier
25. Two-Dimensional Distributions of Ti and Ti+ Densities in High-Pressure Magnetron Sputtering Discharges
26. Direct measurements of sheath-accelerated secondary electrons for monitoring the incident ion flux in plasma immersion ion implantation
27. Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas
28. Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma
29. Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry
30. Resonant Directional Excitation of Helicon Waves by a Helical Antenna
31. New Inductive rf Discharge Using an Internal Metal Antenna
32. A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
33. Hot Spots and Electron Heating Processes in a Helicon-Wave Excited Plasma
34. Radical Control by Wall Heating of a Fluorocarbon Etching Reactor
35. High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma
36. Cross Section Measurements for Electron-Impact Dissociation of CHF3into Neutral and Ionic Radicals
37. Improvement of a Corona-Preionized TEA-CO2 Laser by Means of High-Frequency Corona Discharge
38. In situ Probe of GaN Film Surfaces under Plasma Conditions by Photoluminescence Technique.
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