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A GaN-based pin neutron detector with a 6LiF conversion layer was fabricated, and can be used to detect thermal neutrons. Measurement of the electrical characteristic of the GaN-based pin neutron detector showed that the reverse leakage current of the neutron detector was reduced significantly after deposition of a 6LiF conversion layer on the detector surface. The thermal neutrons used in this experiment were obtained from an 241Am–Be fast neutron source after being moderated by 100-mm-thick high-density polyethylene. The experimental results show that the detector with 16.9-μm thick 6LiF achieved a maximum neutron detection efficiency of 1.9% at a reverse bias of 0 V, which is less than the theoretical detection efficiency of 4.1% calculated for our GaN neutron detectors.

We reported a method combining the gas–liquid interface method and inductively coupled plasma (ICP) to fabricate highly-ordered nanowire arrays on a 2 inch GaAs substrate. A large-area and highly-ordered SiO2 nanosphere monolayer was fabricated and the GaAs nanowire array was etched by ICP. The flow rates and ratios of the etching gases were studied. Finally, highly-ordered GaAs nanowire arrays with high quality surface morphology were obtained with the volumetric flow rates at 9 sccm and 21 sccm for BCl3 and N2 gases, respectively. Reflectance of the samples was found to be consistently below 10%, the lowest being 3%.

For the frequency range of 1 kHz–10 MHz, the interface state density of Ni contacts on p-GaN is studied using capacitance-voltage (C–V) and conductance-frequency-voltage (G–f–V) measurements at room temperature. To obtain the real capacitance and interface state density of the Ni/p-GaN structures, the effects of the series resistance ( ) on high-frequency (5 MHz) capacitance values measured at a reverse and a forward bias are investigated. The mean interface state densities obtained from the – capacitance and the conductance method are and , respectively. Furthermore, the interface state density derived from the conductance method is higher than that reported from the Ni/n-GaN in the literature, which is ascribed to a poor crystal quality and to a large defect density of the Mg-doped p-GaN.