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Laser Induced-Thermionic Vacuum Arc (LTVA) technology was used for depositing uniform intermetallic CoNi thin films of 100 nm thickness. LTVA is an original deposition method using a combination of the typical Thermionic Vacuum Arc (TVA) system and a laser beam provided by a QUANTEL Q-Smart 850 Nd:YAG compact Q-switched laser with a second harmonic module. The novelty is related to the simultaneous deposition of a bi-component metallic thin film using photonic processes of the laser over the plasma deposition, which improves the roughness but also triggers the composition of the deposited thin film. Structural analysis of the deposited thin films confirms the formation of face-centered cubic (fcc) as the main phase CoNi and hexagonal Co3Ni as the minority phase, observed mainly using high-resolution transmission electron microscopy. The magneto-optical measurements suggest an isotropic distribution of the CoNi alloy thin films for the in-plan angular rotation. From the low coercive field of Hc = 40 Oe and a saturation field at 900 Oe, the CoNi thin films obtained by LTVA are considered semi-hard magnetic materials. Magnetic force microscopy reveals spherical magnetic nanoparticles with mean size of about 40–50 nm. The resistivity was estimated at ρ = 34.16 μΩ cm, which is higher than the values for bulk Co and Ni. [ABSTRACT FROM AUTHOR]

Laser-Induced Thermionic Vacuum Arc (LTVA) provides a better way to produce uniform metallic thin films than the classical Thermionic Vacuum Arc (TVA) method. In Ti-doped chromium thin films produced using LTVA, the amorphous chromium is superimposed with small bcc chromium nanoparticles. These amorphous/crystalline structures with small crystallites induce lower roughness and electrical resistivity, reducing electron–phonon scattering and increasing charge transport across LTVA thin films. A significant shift in resistivity for the LTVA samples is observed due to electron scattering on the phonon–crystalline structures in the TVA samples which exhibit larger crystallites. Meanwhile, the wettability measurements reveal a higher contact angle, resulting in a lower surface free energy and consecutively lower dissociation energy for the LTVA-produced thin films than the TVA samples. [ABSTRACT FROM AUTHOR]

Active semiconductor layers of TiO2 were synthesized via pulsed laser deposition in He, N2, O2, or Ar to manufacture DSSC structures. As-prepared nanostructured TiO2 coatings grown on FTO were photosensitized by the natural absorption of the N719 (Ruthenium 535-bis TBA) dye to fabricate photovoltaic structures. TiO2 photoanode nanostructures with increased adsorption areas of the photosensitizer (a combination with voluminous media) were grown under different deposition conditions. Systematic SEM, AFM, and XRD investigations were carried out to study the morphological and structural characteristics of the TiO2 nanostructures. It was shown that the gas nature acts as a key parameter of the architecture and the overall performance of the deposited films. The best electro-optical performance was reached for photovoltaic structures based on TiO2 coatings grown in He, as was demonstrated by the short-circuit current (Isc) of 5.40 mA, which corresponds to the higher recorded roughness (of 44 ± 2.9 nm RMS). The higher roughness is thus reflected in a more efficient and deeper penetration of the dye inside the nanostructured TiO2 coatings. The photovoltaic conversion efficiency (η) was 1.18 and 2.32% for the DSSCs when the TiO2 coatings were deposited in O2 and He, respectively. The results point to a direct correlation between the electro-optical performance of the prepared PV cells, the morphology of the TiO2 deposited layers, and the crystallinity features, respectively. [ABSTRACT FROM AUTHOR]