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Human noroviruses (HuNoVs), the most prevalent viral contaminant in food, account for a substantial proportion of nonbacterial gastroenteritis cases. Extensive work has been focused on the diagnosis of HuNoVs in clinical samples, whereas the availability of sensitive detection methods for their detection in food is lacking. Here, we developed a virus enrichment approach utilizing graphene-based nanocomposites (CTAB-rGO-Fe3O4) that does not rely on large instruments and is suitable for on-site food pretreatment. The recovery efficiency of the developed virus enrichment procedure for serially diluted GII.4 norovirus ranged from 10.06 to 72.67% in strawberries and from 2.66 to 79.65% in oysters. Furthermore, we developed a real-time recombinase polymerase amplification (real-time RPA) assay, which can detect as low as 1.22 genome copies µL−1 of recombinant plasmid standard and has no cross-reactivity with genomes of astrovirus, rotavirus, adenovirus, and MS2 bacteriophage. Notably, the combined virus enrichment and real-time RPA detection assay enhanced the detection limits to 2.84 and 37.5 genome copies g−1 in strawberries and oysters, respectively, compared to those of qPCR. Our strategy, the graphene-based virus enrichment method combined with real-time RPA, presents a promising tool for sensitively detecting HuNoVs in food samples. [ABSTRACT FROM AUTHOR]

In Moiré fringe lithography alignment technology, alignment is realized by monitoring the grating interference fringe image in real-time. The technique exhibits excellent sensitivity to displacement changes and is not easily affected by the gap changes between the mask and silicon wafer. Therefore, this technique is widely used in conventional proximity and contact lithography and new-generation micro- and nanolithography systems. The rapid development of semiconductor and integrated circuit industries, as well as the increasing requirements for the resolution of various nanodevices and systems, have posed new challenges in Moiré fringe lithography alignment technology, which are mainly reflected in alignment accuracy, alignment range, and scheme complexity. In this study, the development history, alignment principle, and overall process of Moiré fringe lithography alignment technology are reviewed; the main factors affecting alignment accuracy are analyzed, and corresponding optimization schemes are provided; and finally, the development trend and research focus of Moiré fringe lithography alignment technology are predicted from the marking structure, alignment scheme, and algorithm processing. [ABSTRACT FROM AUTHOR]