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Flat optics, metasurfaces, metalenses, and related materials promise novel on-demand light modulation within ultrathin layers at wavelength scale, enabling a plethora of next-generation optical devices, also known as metadevices. Metadevices designed with different materials have been proposed and demonstrated for different applications, and the mass production of metadevices is necessary for metadevices to enter the consumer electronics market. However, metadevice manufacturing processes are mainly based on electron beam lithography, which exhibits low productivity and high costs for mass production. Therefore, processes compatible with standard complementary metal–oxide–semiconductor manufacturing techniques that feature high productivity, such as i-line stepper and nanoimprint lithography, have received considerable attention. This paper provides a review of current metasurfaces and metadevices with a focus on materials and manufacturing processes. We also provide an analysis of the relationship between the aspect ratio and efficiency of different materials.

In this study, the phase modulation ability of a dielectric Pancharatnam–Berry (PB) phase metasurface, consisting of nanofins, is theoretically analyzed. It is generally considered that the optical thickness of the unit cell of a PB-phase metasurface is λ/2, i.e., a half-waveplate for polarization conversion. It is found that the λ/2 is not essential for achieving a full 2π modulation. Nevertheless, a λ/2 thickness is still needed for a high polarization conversion efficiency. Moreover, a gradient phase metasurface is designed. With the help of the particle swarm optimization (PSO) method, the wavefront errors of the gradient phase metasurface are reduced by fine-tuning the rotation angle of the nanofins. The diffraction efficiency of the gradient phase metasurface is thus improved from 73.4% to 87.3%. This design rule can be utilized to optimize the efficiency of phase-type meta-devices, such as meta-deflectors and metalenses.