11 results on '"Chen, Frederick T."'
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2. Sub-30nm TiN/Ti/HfOx pillar formed by tone reverse processes for RRAM applications
3. Sub-14 nm HSQ line patterning by e-beam dose proximity effect correction assisted with designed line CD/pitch split
4. Substrate and underlayer dependence of sub-32nm e-beam HSQ pillar patterning process for RRAM application
5. Transfer optimized dry development process of sub-32nm HSQ/AR3 BLR resist pillar from low-K etcher to metal etcher
6. Complementary polarity exposures for cost-effective line-cutting in multiple patterning lithography
7. EUVL mask patterning with blanks from commercial suppliers
8. Asymmetry and thickness effects in reflective EUV masks
9. Polarizing Assist Features for High-NA Optical Lithography
10. Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist
11. Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-μm-generation advanced mask fabrication
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