1. EUV reflectivity and stability of tri-component Al-based multilayers
- Author
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F. Delmotte, A. Ziani, Arnaud Jérôme, Marc Roulliay, F. Auchere, S. de Rossi, Evgueni Meltchakov, Françoise Varniere, Françoise Bridou, Xiaxiang Zhang, and Ch. Bourassin-Bouchet
- Subjects
Materials science ,business.industry ,Extreme ultraviolet lithography ,Synchrotron radiation ,Synchrotron ,law.invention ,chemistry.chemical_compound ,Optical coating ,chemistry ,law ,Extreme ultraviolet ,Silicon carbide ,High harmonic generation ,Optoelectronics ,Thermal stability ,business - Abstract
We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physi cs, high-order harmonic generation or synchrotron r adiation. It was found that an introduction of refractory metal in A l-based periodic stack helps to reduce significantl y an interfacial roughness and provides for a higher theoretical ref lectance in the spectral range from 17 to 40 nm. Th e normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 n m and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B 4C multilayer mirrors, which have been optimized, fa bricated and characterized with x-rays and synchrot ron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been ob served over 3 years.
- Published
- 2011
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