38 results on '"Kazazis, Dimitrios"'
Search Results
2. Vertically tailored hybrid multilayer EUV photoresist with vertical molecular wire structure
3. Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
4. Advancements in EUV photoresists for high-NA lithography
5. The EUV lithography resist screening activities in H2-2022
6. Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography
7. On EUV resist screening with interference lithography in H1-2022
8. EUV mask defect material characterization through actinic lensless imaging
9. EUV resist screening update: progress towards high-NA lithography
10. Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks
11. Lensless EUV mask inspection for anamorphic patterns
12. Chemically-amplified backbone scission (CABS) resist for EUV lithography
13. High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
14. Laser repair and clean of extreme ultraviolet lithography photomasks
15. Resistless EUV lithography: patterning with EUV-induced surface reactions (Conference Presentation)
16. Illumination control in lensless imaging for EUV mask inspection and review
17. Electrically tunable filter based on plasmonic phase retarder and liquid crystals
18. EUV reticle inspection using phase retrieval algorithms: a performance comparison
19. Resolution enhancement for lensless mask metrology with RESCAN
20. Tunable filter using birefringent plasmonic structures and liquid crystals (Conference Presentation)
21. Lensless metrology for semiconductor lithography at EUV
22. Amplitude and phase defect inspection on EUV reticles using RESCAN
23. Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
24. Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography
25. Phase defect inspection on EUV masks using RESCAN
26. Progress in multi-trigger resists for EUV lithography (Conference Presentation)
27. Studying resist performance for contact holes printing using EUV interference lithography
28. Experimental evaluation of the impact of EUV pellicles on reticle imaging
29. Multi-trigger resist for electron beam and extreme ultraviolet lithography
30. A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks
31. High-resolution EUV lithography using a multi-trigger resist
32. Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking
33. High-throughput defect inspection for arbitrarily shaped EUV absorber patterns (Conference Presentation)
34. Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
35. Through-pellicle inspection of EUV masks
36. Actinic inspection of EUV reticles with arbitrary pattern design
37. Multi-trigger resist for electron beam lithography
38. Extreme ultraviolet patterning of tin-oxo cages
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