9 results on '"Mercha, Abdelkarim"'
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2. Maintaining Moore’s law: enabling cost-friendly dimensional scaling
3. DTCO at N7 and beyond: patterning and electrical compromises and opportunities
4. Standard cell design in N7: EUV vs. immersion
5. Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
6. The economic impact of EUV lithography on critical process modules
7. The need for EUV lithography at advanced technology for sustainable wafer cost
8. 1/f noise in deep-submicron CMOS technology for RF and analog applications
9. Impact of the back-gate bias on the low-frequency noise of partially depleted silicon-on-insulator MOSFETs
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