29 results on '"Rieger, Michael"'
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2. Mask cost reduction and yield optimization using design intent
3. Maintaining lithographic quality during OPC for low-k1 and MEEF processes constrained by mask dimensional rules
4. Placing assist features in layout using a process model
5. Model-based interpretation filtering for complex two-dimensional layout features
6. Classical control theory applied to OPC correction segment convergence
7. Mathematically describing the target contour in silicon such that model-based OPC can best realize design intent
8. Model-based methodology for reducing OPC output pattern complexity
9. Anticipating and controlling mask costs within EDA physical design
10. A methodology to calculate line-end correction feature performance as a function of reticle cost
11. Multiple-stage optical proximity correction
12. An Effective Distributed Architecture for OPC & RET Applications
13. Programmable RET Mask Layout Verification
14. Adaptive OPC with a conformal target layout
15. Verifying RET mask layouts
16. OPC strategies to minimize mask cost and writing time
17. Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
18. Alternating PSM optimization using model-based OPC
19. Optical proximity effects correction at 0.25 um incorporating process variations in lithography
20. Mask fabrication rules for proximity-corrected patterns
21. Customizing proximity correction for process-specific objectives
22. Quantifying proximity and related effects in advanced wafer processes
23. Optimizing proximity correction for wafer fabrication processes
24. Fast proximity correction with zone sampling
25. Using behavior modeling for proximity correction
26. Lithographic alternatives to PSM repair
27. Specifying phase-shift mask image quality parameters
28. Phase-shift mask applications
29. Image Quality Enhancements For Raster Scan Lithography
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