6 results on '"Ziebold, Ralf"'
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2. Determination of mask induced polarization effects occurring in hyper NA immersion lithography.
3. Methodology and practical application of an ArF resist model calibration.
4. Impact of measured pupil illumination fill distribution on lithography simulation and OPC models.
5. Method to improve the resolution of contact holes.
6. High-accuracy simulation-based optical proximity correction.
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