12 results on '"de Gendt, Stefan"'
Search Results
2. SEMI-CenterNet: a machine learning facilitated approach for semiconductor defect inspection.
3. Sensitizers in EUV Chemically Amplified Resist: Mechanism of sensitivity improvement.
4. Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement.
5. EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study.
6. Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry.
7. Hyper-NA EUV lithography: an imaging perspective.
8. Extraction of roughness measurements from thin resists with low signal-to-noise-ratio (SNR) SEM images by applying deep learning denoiser.
9. Low-voltage aberration-corrected SEM metrology of thin resist for high-NA EUVL.
10. Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography.
11. Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography.
12. Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles.
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