6 results on '"Maes, J W"'
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2. High-k Materials for Advanced Gate Stack Dielectrics: a Comparison of ALCVD and MOCVD as Deposition Technologies
3. Physical-Chemical Evolution upon Thermal Treatments of Al2O3, HfO2 and Al/Hf Composite Materials Deposited by ALCVD™
4. Physical-Chemical Evolution of Hf-aluminates upon Thermal Treatments
5. ALD HfO2 surface preparation study
6. Effect of Al-content and Post Deposition Annealing on the Electrical Properties of Ultra-thin HfAlxOy Layers
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