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Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography. Mask-free multi-photon lithography allows the straightforward fabrication of nanostructures, but high precision and good resolution can be challenging to achieve. Here, the authors report a combination of photo-inhibition and chemical quenchers for improved lithography performance. [ABSTRACT FROM AUTHOR]

Advances in direct laser writing to attain super-resolution are required to improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed to improve the resolution of direct laser writing while preventing the chromatic aberration characteristics of conventional multicolor photoinhibition lithography, thus offering a robust tool for fabricating 2D and 3D nanophotonic structures. A minimal feature size of 36 nm and a resolution of 140 nm were achieved with a writing speed that was at least 10 times faster than existing photoinhibition lithography. Super-resolution and fast scanning enable the fabrication of spin-decoupled metasurfaces in the visible range within a printing duration of a few minutes. Finally, a subwavelength photonic crystal with a near-ultraviolet structural color was fabricated to demonstrate the potential of 3D printing. This technique is a flexible and reliable tool for fabricating ultracompact optical devices. [ABSTRACT FROM AUTHOR]

Al-Zr master alloy was prepared by aluminothermic reduction in cryolite melt without alumina impurity. The Al-Zr master alloy was characterized by x-ray diffraction, scanning electron microscopy, and energy-dispersive spectroscopy. The composition of the master alloy was analyzed by inductively coupled plasma optical emission spectrometry. The results indicated that Al-Zr master alloy with high purity could be obtained when byproduct AlO was dissolved in the cryolite melt. The Al-Zr alloy was embedded in the Al matrix in the form of AlZr phase with long rod or tetragonal morphology due to temperature variation. Finally, we obtained Al-Zr alloy with 7 wt.% Zr by aluminothermic reduction for 90 min in cryolite melt at 980°C. [ABSTRACT FROM AUTHOR]