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Using spectroscopic ellipsometry, the temperature-dependence of the dielectric functions of a series of Hg1−xCdxSe thin films deposited on both ZnTe/Si(112) and GaSb(112) substrates were investigated. Initially, for each sample, room-temperature ellipsometric spectra were obtained from 35 meV to 6 eV using two different ellipsometers. Subsequently, ellipsometry spectra were obtained from 10 K to 300 K by incorporating a cryostat to the ellipsometer. Using a standard inversion technique, the spectroscopic ellipsometric data were modeled in order to obtain the temperature-dependent dielectric functions of each of the Hg1−xCdxSe thin films. The results indicate that the E1 critical point blue-shifts as a function of Cd-alloy concentration. The temperature-dependence of E1 was fitted to a Bose-Einstein occupation distribution function, which consequently allowed us to determine the electron-phonon coupling of Hg1−xCdxSe alloys. From the fitting results, we obtain a value of 17 ± 2 meV for the strength of the electron-phonon coupling for Hg1−xCdxSe alloy system, which compares nominally with the binary systems, such as CdSe and CdTe, which have values around 38 meV and 16 meV, respectively. This implies that the addition of Hg into the CdSe binary system does not significantly alter its electron-phonon coupling strength. Raman spectroscopy measurements performed on all the samples show the HgSe-like transverse optic (TO) and longitudinal optic (LO) phonons (∼ 130 cm−1 and ∼ 160 cm−1, respectively) for all the samples. While there is a slight red-shift of the HgSe-like TO peak as a function of the Cd-concentration, HgSe-like LO peak does not significantly change with the alloy concentration. [ABSTRACT FROM AUTHOR]

In-situ cathodoluminescence (CL) measurement during growth of gallium nitride (GaN) by molecular beam epitaxy (MBE) was investigated for determining substrate temperature. Cathodoluminescence was easily observed from room temperature up to and beyond typical temperatures used during growth. Determination of the peak energy of the CL spectrum allows unambiguous determination of the substrate temperature. Temperature drift and reproducibility issues during growth of GaN were observed using the in-situ CL measurement. [ABSTRACT FROM AUTHOR]

We calculate the radiative, Auger, and the Shockley-Read-Hall recombination rates with Fermi-Dirac statistics and accurate band structures to explain the measured temperature dependence and doping dependence of minority carrier lifetimes in three n- and one p-type sample. We show that a trap state tracking the conduction band edge with very small activation energy can explain the lifetimes in the n-doped samples considered here. Similarly, for moderately p-doped HgCdTe alloy, a trap level at 75 meV is needed to explain the observed lifetimes. In either case, movement of Fermi level with respect to the trap level explains the temperature dependence of the lifetimes. [ABSTRACT FROM AUTHOR]

We have initiated a joint effort to better elucidate the fundamental mechanisms underlying As-doping in molecular beam epitaxy (MBE)-grown HgCdTe. We have greatly increased the As incorporation rate by using an As cracker cell. With a cracker temperature of 700°C, As incorporation as high as 4 x 1020 cm-3 has been achieved by using an As-reservoir temperature of only 175°C. This allows the growth of highly doped layers with high quality as measured by low dislocation density. Annealing experiments show higher As-activation efficiency with higher anneal temperatures for longer time and higher Hg overpressures. Data are presented for layers with a wide range of doping levels and for layer composition from 0.2 to 0.6. [ABSTRACT FROM AUTHOR]

Variable magnetic-field Hall and transient photoconductance-lifetime measurements were performed on a series of undoped, In-doped, and As-doped HgCdTe samples grown by molecular beam epitaxy (MBE). Use of quantitative mobility-spectrum analysis (QMSA) combined with multiple carrier-fitting (MCF) techniques indicates that the majority of samples contain an interfacial n-type layer that significantly influences the interpretation of the electrical measurements. This n-type layer completely masks the high-quality electrical properties of undoped or low n-type In-doped HgCdTe, as well as complicating the interpretation of activation in As-doped p-type HgCdTe. Introduction of an intentional n-type background, typically created through doping with In to "recover" high mobility, is actually shown to increase the "bulk" layer conductivity to a level comparable to the interface layer conductivity. Photoconductance-lifetime measurements suggest that In-doping may introduce Shockley-Read-Hall (SRH) recombination centers. Variable-field Hall analysis is shown to be essential for characterizing p-type material. Photoconductance-lifetime measurements suggest that trapping states may be introduced during the incorporation and activation of As. Two distinctly different types of temperature dependencies were observed for the lifetimes of As-doped samples. [ABSTRACT FROM AUTHOR]

Variable magnetic-field Hall-effect measurements were performed on two thick GaN samples grown by hydride vapor-phase epitaxy (HVPE), one freestanding and one attached to the sapphire substrate. Results are compared to those obtained using the more standard, single magnetic-field Hall measurements. In both samples, a second low-mobility electron was indicated that significantly influenced interpretation of single-field Hall measurements, particularly at low temperatures. Extraction of the bulk carrier using fits to the variable-field Hall data allowed a more accurate determination of the temperature dependence of the bulk electrical properties and, hence, basic physical parameters. In addition, the quantitative mobility-spectrum analysis (QMSA) technique, reported here for the first time on GaN, indicated a continuous and significant spread in mobility for the bulk electron, likely with sample thickness. Thus, even the "improved" results, based on modeling the multiple-carrier fitting (MCF) analysis, obtained in this study should be viewed with some suspicion, as they clearly represent an average over an electrically inhomogeneous sample. [ABSTRACT FROM AUTHOR]

Variable magnetic field Hall and transient photoconductance lifetime measurements were performed on a series of undoped, In-doped, and As-doped HgCdTe samples grown by molecular beam epitaxy and metalorganic chemical vapor deposition. Temperature variation and, in the case of Hall, magnetic-field variation are needed to give a more complete picture of the mechanisms that control lifetimes in HgCdTe samples. Recent predictions of recombination lifetimes from full band structure calculations were compared to experimental lifetimes at various doping levels at long-wave infrared (LWIR) and mid-wave infrared (MWIR) compositions. For n-type material, lifetimes from low doping levels fall well below the predictions, implying that Shockley-Read-Hall (SRH) recombination is still dominant. MWIR samples have a lifetime that increases somewhat with carrier concentration, suggesting that In doping passivates the SRH defects for that composition. Lifetimes in p-type MWIR material appear to be well-explained by recent theoretical calculations. In p-type material, trapping states may be introduced during the incorporation and activation of As, since some samples with unusually long lifetimes had a distinctly different type of temperature dependence. [ABSTRACT FROM AUTHOR]

The dependence of characteristics of plasma-assisted molecular beam epitaxy-grown ZnO thin films on different postgrowth annealing conditions was investigated. It was found that, under oxygen atmosphere, annealing temperature can profoundly affect the morphological, electrical, and optical properties of ZnO thin films. In particular, the surface morphology changed from a relatively smooth surface before annealing to various island morphologies after annealing above 800° C for samples grown directly on sapphire without a buffer layer. It is speculated that intrinsic stress due to lattice mismatch drives the island formation and the high temperature provides the energy needed for this surface rearrangement. Single-field Hall-effect measurement showed that the carrier concentration improved by an order of magnitude and the mobility increased from about 30 cm²/Vs to ∼ 70 cm² /Vs by annealing at 750°C. Variable-field Hall effect shows that a model with two carriers, one a degenerate low-mobility electron and the other a higher mobility non-degenerate electron, is needed to explain the transport properties of the thin film. Analysis indicates that annealing at 750°C decreased the carrier concentration and increased the mobility for the high-mobility carrier. Annealing also led to a significant improvement in photoluminescence, with temperatures of ∼ 750-850°C yielding the best results. [ABSTRACT FROM AUTHOR]